通过溅射CrN薄膜提高CoCrNiSi中熵合金的耐腐蚀性和耐磨性

Improvement of Corrosion and Wear Resistance of CoCrNiSi Medium-Entropy Alloy by Sputtering CrN Film.

作者信息

Chang Yi-Chun, Lin Kaifan, Ma Ju-Lung, Huang Han-Fu, Chang Shih-Hsien, Lin Hsin-Chih

机构信息

Department of Materials Science and Engineering, National Taiwan University, Taipei 10617, Taiwan.

Department of Materials and Mineral Resources Engineering, National Taipei University of Technology, Taipei 10608, Taiwan.

出版信息

Materials (Basel). 2023 Feb 10;16(4):1482. doi: 10.3390/ma16041482.

DOI:10.3390/ma16041482

PMID:36837112

原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC9959495/

Abstract

In this study, Co, Cr, and Ni were selected as the equal-atomic medium entropy alloy (MEA) systems, and Si was added to form CoCrNiSi MEA. In order to further improve its wear and corrosion properties, CrN film was sputtered on the surface. In addition, to enhance the adhesion between the soft CoCrNiSi substrate and the super-hard CrN film, a Cr buffer layer was pre-sputtered on the CoCrNiSi substrate. The experimental results show that the CrN film exhibits a columnar grain structure, and the film growth rate is about 2.022 μm/h. With the increase of sputtering time, the increase in CrN film thickness, and the refinement of columnar grains, the wear and corrosion resistance improves. Among all CoCrNiSi MEAs without and with CrN films prepared in this study, the CoCrNiSi MEA with 3 h-sputtered CrN film has the lowest wear rate of 2.249 × 10 mm·m·N, and the best corrosion resistance of I 19.37 μA·cm and R 705.85 Ω·cm.

摘要

在本研究中，选择Co、Cr和Ni作为等原子中熵合金（MEA）体系，并添加Si以形成CoCrNiSi MEA。为了进一步改善其耐磨和耐腐蚀性能，在其表面溅射CrN薄膜。此外，为了增强软质CoCrNiSi基体与超硬CrN薄膜之间的附着力，先在CoCrNiSi基体上预溅射一层Cr缓冲层。实验结果表明，CrN薄膜呈现柱状晶粒结构，薄膜生长速率约为2.022μm/h。随着溅射时间的增加、CrN薄膜厚度的增加以及柱状晶粒的细化，耐磨和耐腐蚀性能得到改善。在本研究制备的所有未涂覆和涂覆CrN薄膜的CoCrNiSi MEA中，溅射3小时CrN薄膜的CoCrNiSi MEA磨损率最低，为2.249×10 mm·m·N，耐腐蚀性最佳，I为19.37μA·cm，R为705.85Ω·cm。