Geng Zhichao, Huang Ning, Castelli Marco, Fang Fengzhou
Centre of Micro/Nano Manufacturing Technology (MNMT-Dublin), University College Dublin, D04 V1W8 Dublin, Ireland.
State Key Laboratory of Precision Measuring Technology and Instruments, Laboratory of Micro/Nano Manufacturing Technology (MNMT), Tianjin University, Tianjin 300072, China.
Micromachines (Basel). 2023 Jan 29;14(2):343. doi: 10.3390/mi14020343.
Roughness down to atomic and close-to-atomic scale is receiving an increasing attention in recent studies of manufacturing development, which can be realized by high-precision polishing processes. This review presents polishing approaches at atomic and close-to-atomic scale on planar and curved surfaces, including chemical mechanical polishing, plasma-assisted polishing, catalyst-referred etching, bonnet polishing, elastic emission machining, ion beam figuring, magnetorheological finishing, and fluid jet polishing. These polishing approaches are discussed in detail in terms of removal mechanisms, polishing systems, and industrial applications. The authors also offer perspectives for future studies to address existing and potential challenges and promote technological progress.
在最近的制造发展研究中，降至原子和近原子尺度的粗糙度受到了越来越多的关注，这可以通过高精度抛光工艺来实现。本文综述了在平面和曲面上进行原子和近原子尺度抛光的方法，包括化学机械抛光、等离子体辅助抛光、催化蚀刻、气囊抛光、弹性发射加工、离子束修形、磁流变抛光和流体喷射抛光。从去除机理、抛光系统和工业应用等方面详细讨论了这些抛光方法。作者还为未来的研究提供了展望，以应对现有和潜在的挑战并推动技术进步。
