Liu Jiaming, He Jiakuan, Peng Yunfeng
Opt Express. 2023 Dec 18;31(26):43535-43549. doi: 10.1364/OE.502933.
Magnetorheological polishing (MRF) has emerged as a critical non-contact sub-aperture polishing technology due to its notable attributes of high precision and minimal damage. However, MRF's inherent D-shaped removal function leads to reduced convergence efficiency of surface form error and introduces mid-spatial-frequency (MSF) waviness. To address these challenges, we propose magnetorheological precession finishing (MRPF) technology, which ingeniously combines MRF with bonnet precession polishing to generate a Gaussian-like removal function. A pivotal component of what we believe to be a novel approach is the design and fabrication of a specialized hemispherical magnetorheological precession polishing head. The design process incorporates magnetostatic simulations and magnetic force analysis to determine the optimal generating conditions for magnetorheological ribbons. Spot polishing experiments confirm the suitability of a 30° precession angle. Experimental results demonstrate that 8-step polishing achieves a Gaussian-like removal function. Additionally, uniform polishing of fused quartz surfaces significantly reduces Ra from 0.7 µm to 2.14 nm. This research showcases the feasibility of MRPF as a new technical route to achieve Gaussian-like removal functions and nanometer-scaled surface roughness.
磁流变抛光（MRF）因其高精度和极小损伤的显著特性，已成为一种关键的非接触式子孔径抛光技术。然而，MRF固有的D形去除函数导致表面形状误差的收敛效率降低，并引入了中频（MSF）波纹。为应对这些挑战，我们提出了磁流变进动抛光（MRPF）技术，该技术巧妙地将MRF与帽盖进动抛光相结合，以生成类似高斯的去除函数。我们认为这种新颖方法的一个关键组成部分是专门的半球形磁流变进动抛光头的设计与制造。设计过程包括静磁模拟和磁力分析，以确定磁流变带的最佳生成条件。点抛光实验证实了30°进动角的适用性。实验结果表明，八步抛光可实现类似高斯的去除函数。此外，熔融石英表面的均匀抛光显著降低了表面粗糙度，将平均粗糙度从0.7μm降至2.14nm。本研究展示了MRPF作为实现类似高斯去除函数和纳米级表面粗糙度的新技术途径的可行性。
