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硫醇盐自组装单分子层在金、铂和铜上的电化学稳定性

Electrochemical Stability of Thiolate Self-Assembled Monolayers on Au, Pt, and Cu.

作者信息

Ramos Nathanael C, Medlin J Will, Holewinski Adam

机构信息

Department of Chemical and Biological Engineering, University of Colorado Boulder, JSCBB, 3415 Colorado Avenue, Boulder, Colorado 80303, United States.

Renewable and Sustainable Energy Institute, University of Colorado Boulder, SEEC, 4001 Discovery Dr, Boulder, Colorado 80309, United States.

出版信息

ACS Appl Mater Interfaces. 2023 Mar 22;15(11):14470-14480. doi: 10.1021/acsami.3c01224. Epub 2023 Mar 10.

Abstract

Self-assembled monolayers (SAMs) of thiolates have increasingly been used for modification of metal surfaces in electrochemical applications including selective catalysis (e.g., CO reduction, nitrogen reduction) and chemical sensing. Here, the stable electrochemical potential window of thiolate SAMs on Au, Pt, and Cu electrodes is systematically studied for a variety of thiols in aqueous electrolyte systems. For fixed tail-group functionality, the reductive stability of thiolate SAMs is found to follow the trend Au < Pt < Cu; this can be understood by considering the combined influences of the binding strength of sulfur and competitive adsorption of hydrogen. The oxidative stability of thiolate SAMs is found to follow the order: Cu < Pt < Au, consistent with each surface's propensity toward surface oxide formation. The stable reductive and oxidative potential limits are both found to vary linearly with pH, except for reduction above pH ∼10, which is independent of pH for most thiol compositions. The electrochemical stability across different functionalized thiols is then revealed to depend on many different factors including SAM defects (accessible surface metal atom sites decrease stability), intermolecular interactions (hydrophilic groups reduce the stability), and SAM thickness (stability increases with alkanethiol carbon chain length) as well as factors such as SAM-induced surface reconstruction and the ability to directly oxidize or reduce the non-sulfur part of the SAM molecule.

摘要

硫醇盐自组装单分子层(SAMs)越来越多地用于电化学应用中金属表面的修饰,包括选择性催化(如CO还原、氮还原)和化学传感。在此,针对水性电解质体系中的多种硫醇,系统研究了金、铂和铜电极上硫醇盐SAMs的稳定电化学势窗。对于固定的尾基官能团,发现硫醇盐SAMs的还原稳定性遵循Au < Pt < Cu的趋势;通过考虑硫的结合强度和氢的竞争吸附的综合影响可以理解这一点。发现硫醇盐SAMs的氧化稳定性遵循Cu < Pt < Au的顺序,这与每个表面形成表面氧化物的倾向一致。除了在pH值约为10以上的还原情况外,稳定的还原和氧化电位极限均发现随pH值呈线性变化,对于大多数硫醇组成而言,pH值约为10以上的还原情况与pH值无关。然后发现,不同功能化硫醇的电化学稳定性取决于许多不同因素,包括SAM缺陷(可及表面金属原子位点会降低稳定性)、分子间相互作用(亲水基团会降低稳定性)和SAM厚度(稳定性随链烷硫醇碳链长度增加),以及诸如SAM诱导的表面重构和直接氧化或还原SAM分子非硫部分的能力等因素。

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