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多靶反应磁控溅射制备钼酸锶薄膜

Multitarget Reactive Magnetron Sputtering towards the Production of Strontium Molybdate Thin Films.

作者信息

Andrulevičius Mindaugas, Artiukh Evgenii, Suchaneck Gunnar, Wang Sitao, Sobolev Nikolai A, Gerlach Gerald, Tamulevičienė Asta, Abakevičienė Brigita, Tamulevičius Sigitas

机构信息

Institute of Materials Science, Kaunas University of Technology, K. Baršausko St. 59, LT-51423 Kaunas, Lithuania.

Solid State Electronics Laboratory, Technische Universität Dresden, 01062 Dresden, Germany.

出版信息

Materials (Basel). 2023 Mar 8;16(6):2175. doi: 10.3390/ma16062175.

Abstract

X-ray photoelectron spectroscopy was used to study the direct synthesis of strontium and molybdenum oxide thin films deposited by multitarget reactive magnetron sputtering (MT-RMS). Sr and Mo targets with a purity of 99.9% and 99.5%, respectively, were co-sputtered in an argon-oxygen gas mixture. The chamber was provided with an oxygen background flow plus an additional controlled oxygen supply to each of the targets. We demonstrate that variation in the power applied to the Mo target during MT-RMS enables the production of strontium and molybdenum oxide films with variable concentrations of Mo atoms. Both molybdenum and strontium were found in the oxidized state, and no metallic peaks were detected. The deconvoluted high-resolution XPS spectra of molybdenum revealed the presence of several Mo 3d peaks, which indicates molybdenum bonds in a lower valence state. Contrary to the Mo spectra, the high-resolution strontium Sr 3d spectra for the same samples were very similar, and no additional peaks were detected.

摘要

采用X射线光电子能谱研究了通过多靶反应磁控溅射(MT-RMS)沉积的锶钼氧化物薄膜的直接合成。分别使用纯度为99.9%和99.5%的Sr靶和Mo靶,在氩氧混合气体中进行共溅射。反应室配备有氧气背景气流以及向每个靶额外提供的可控氧气供应。我们证明,在多靶反应磁控溅射过程中,施加到Mo靶上的功率变化能够制备出Mo原子浓度可变的锶钼氧化物薄膜。钼和锶均处于氧化态,未检测到金属峰。钼的去卷积高分辨率XPS光谱显示存在多个Mo 3d峰,这表明钼以较低价态成键。与Mo光谱不同,相同样品的高分辨率锶Sr 3d光谱非常相似,未检测到额外的峰。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/0d19/10056819/c643de79cba4/materials-16-02175-g001.jpg

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