Paramasivam Pattunnarajam, Gowthaman Naveenbalaji, Srivastava Viranjay M
Electronics and Communication Engineering, Prince Shri Venkateshwara Padmavathy Engineering College, Chennai 600127, India.
Department of Electronic Engineering, Howard College, University of KwaZulu-Natal, Durban 4041, South Africa.
Nanomaterials (Basel). 2023 Mar 7;13(6):959. doi: 10.3390/nano13060959.
This research work uses spds* tight-binding models to design and analyze the structural properties of group IV and III-V oriented, rectangular Silicon (Si) and Gallium Arsenide (GaAs) Nanowires (NWs). The electrical characteristics of the NWs, which are shielded with Lanthanum Oxide (LaO) material and the orientation with z [001] using the Non-Equilibrium Green Function (NEGF) method, have been analyzed. The electrical characteristics and the parameters for the multi-gate nanowires have been realized. A nanowire comprises a heavily doped n donor source and drains doping and n-donor doping at the channel. The specified nanowire has a gate length and channel length of 15 nm each, a source-drain device length L = 35 nm, with LaO as 1 nm (gate dielectric oxide) each on the top and bottom of the core material (Si/GaAs). The Gate-All-Around (GAA) Si NW is superior with a high (I/I ratio) of 1.06 × 10, and a low leakage current, or OFF current (I), of 3.84 × 10 A. The measured values of the mid-channel conduction band energy (E) and charge carrier density (ρ) at V = V = 0.5 V are -0.309 eV and 6.24 × 10 C/cm, respectively. The nanowires with hydrostatic strain have been determined by electrostatic integrity and increased mobility, making them a leading solution for upcoming technological nodes. The transverse dimensions of the rectangular nanowires with similar energy levels are realized and comparisons between Si and GaAs NWs have been performed.
本研究工作使用spds*紧束缚模型来设计和分析IV族以及III - V族取向的矩形硅(Si)和砷化镓(GaAs)纳米线(NWs)的结构特性。已使用非平衡格林函数(NEGF)方法分析了用氧化镧(LaO)材料屏蔽且沿z [001]取向的纳米线的电学特性。实现了多栅纳米线的电学特性和参数。一根纳米线包括重掺杂的n型施主源极和漏极掺杂以及沟道处的n型施主掺杂。指定的纳米线的栅极长度和沟道长度均为15 nm,源漏器件长度L = 35 nm,在核心材料(Si / GaAs)的顶部和底部各有1 nm厚的LaO作为栅极介电氧化物。全栅(GAA)硅纳米线表现优异,具有1.06×10的高(I / I比)以及3.84×10 A的低漏电流,即关断电流(I)。在V = V = 0.5 V时,沟道中部导带能量(E)和电荷载流子密度(ρ)的测量值分别为 - 0.309 eV和6.24×10 C/cm。具有流体静力学应变的纳米线已通过静电完整性和增加的迁移率得以确定,并使其成为未来技术节点的领先解决方案。实现了具有相似能级的矩形纳米线的横向尺寸,并对硅和砷化镓纳米线进行了比较。