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双脉冲激光沉积系统用于生长复杂材料和异质结构。

Dual pulsed laser deposition system for the growth of complex materials and heterostructures.

机构信息

CNR-IOM Istituto Officina dei Materiali, TASC Laboratory, Area Science Park, S.S. 14, km 163.5, I-34149 Trieste, Italy.

Department of Molecular Sciences and Nanosystems, Ca' Foscari University of Venice, 30172 Venice, Italy.

出版信息

Rev Sci Instrum. 2023 Mar 1;94(3):033903. doi: 10.1063/5.0138889.

DOI:10.1063/5.0138889
PMID:37012774
Abstract

Here, we present an integrated ultra-high-vacuum (UHV) apparatus for the growth of complex materials and heterostructures. The specific growth technique is the Pulsed Laser Deposition (PLD) by means of a dual-laser source based on an excimer KrF ultraviolet and solid-state Nd:YAG infra-red lasers. By taking advantage of the two laser sources-both lasers can be independently used within the deposition chambers-a large number of different materials-ranging from oxides to metals, to selenides, and others-can be successfully grown in the form of thin films and heterostructures. All of the samples can be in situ transferred between the deposition chambers and the analysis chambers by using vessels and holders' manipulators. The apparatus also offers the possibility to transfer samples to remote instrumentation under UHV conditions by means of commercially available UHV-suitcases. The dual-PLD operates for in-house research as well as user facility in combination with the Advanced Photo-electric Effect beamline at the Elettra synchrotron radiation facility in Trieste and allows synchrotron-based photo-emission as well as x-ray absorption experiments on pristine films and heterostructures.

摘要

在这里,我们展示了一种用于生长复杂材料和异质结构的集成超高真空(UHV)设备。具体的生长技术是基于准分子 KrF 紫外和固态 Nd:YAG 红外激光器的双激光源的脉冲激光沉积(PLD)。利用这两个激光源——两个激光器都可以在沉积室中独立使用——可以成功地以薄膜和异质结构的形式生长大量不同的材料,从氧化物到金属、硒化物等。所有的样品都可以通过容器和支架操纵器在沉积室和分析室之间进行原位转移。该设备还可以通过商业上可用的 UHV 行李箱将样品转移到远程仪器仪表下的 UHV 条件下。双 PLD 可用于内部研究以及与埃莱特拉同步辐射设施中的先进光电效应光束线相结合的用户设施,允许在原始薄膜和异质结构上进行基于同步加速器的光发射以及 X 射线吸收实验。

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