Natural & Medical Sciences Research Center, University of Nizwa, Nizwa 616, Oman.
School of Life Sciences, University of Warwick, Coventry CV4 7AL, UK.
Int J Mol Sci. 2023 Mar 23;24(7):6036. doi: 10.3390/ijms24076036.
Climate changes abruptly affect optimum growth temperatures, leading to a negative influence on plant physiology and productivity. The present study aimed to investigate the extent of low-temperature stress effects on date palm growth and physiological indicators under the exogenous application of silicon (Si). Date palm seedlings were treated with Si (1.0 mM) and exposed to different temperature regimes (5, 15, and 30 °C). It was observed that the application of Si markedly improved fresh and dry biomass, photosynthetic pigments (chlorophyll and carotenoids), plant morphology, and relative water content by ameliorating low-temperature-induced oxidative stress. Low-temperature stress (5 and 15 °C), led to a substantial upregulation of ABA-signaling-related genes ( and ) in non Si treated plants, while Si treated plants revealed an antagonistic trend. However, jasmonic acid and salicylic acid accumulation were markedly elevated in Si treated plants under stress conditions (5 and 15 °C) in comparison with non Si treated plants. Interestingly, the upregulation of low temperature stress related plant plasma membrane ATPase ( and ) and short-chain dehydrogenases/reductases (), responsible for cellular physiology, stomatal conductance and nutrient translocation under silicon applications, was observed in Si plants under stress conditions in comparison with non Si treated plants. Furthermore, a significant expression of was detected in Si plants under stress, leading to the significant accumulation of Si in roots and shoots. In contrast, non Si plants demonstrated a low expression of under stress conditions, and thereby, reduced level of Si accumulation were observed. Less accumulation of oxidative stress was evident from the expression of and . Additionally, Si plants revealed a significant exudation of organic acids (succinic acid and citric acid) and nutrient accumulation (K and Mg) in roots and shoots. Furthermore, the application of Si led to substantial upregulation of the low temperature stress related soybean cold regulated gene () and (), involved in the expression of CBF/DREB (C-repeat binding factor/dehydration responsive element binding factor) gene family under stress conditions in comparison with non Si plants. The current research findings are crucial for exploring the impact on morpho-physio-biochemical attributes of date palms under low temperature and Si supplementation, which may provide an efficient strategy for growing plants in low-temperature fields.
气候变化会突然影响植物的最佳生长温度,从而对植物的生理和生产力产生负面影响。本研究旨在探讨外源硅(Si)处理对低温胁迫下生长和生理指标的影响。用 Si(1.0 mM)处理枣椰树苗并暴露于不同温度(5、15 和 30°C)下。结果表明,Si 的应用显著提高了鲜重和干重生物量、光合色素(叶绿素和类胡萝卜素)、植物形态和相对含水量,从而改善了低温引起的氧化胁迫。低温胁迫(5 和 15°C)导致非 Si 处理植物中 ABA 信号相关基因(和)的大量上调,而 Si 处理植物则呈现拮抗趋势。然而,在 Si 处理植物中,胁迫条件下(5 和 15°C),茉莉酸和水杨酸的积累明显高于非 Si 处理植物。有趣的是,与非 Si 处理植物相比,胁迫条件下 Si 处理植物的低温胁迫相关质膜 ATP 酶(和)和短链脱氢酶/还原酶()的上调,负责细胞生理、气孔导度和养分转运,在 Si 处理植物中观察到。此外,在胁迫条件下,Si 处理植物中检测到显著的表达,导致 Si 在根和茎中的显著积累。相比之下,非 Si 植物在胁迫条件下表现出的表达较低,因此观察到 Si 积累水平降低。通过和的表达,氧化应激的积累减少。Si 植物还在根和茎中表现出显著的有机酸(琥珀酸和柠檬酸)和养分(K 和 Mg)的分泌和积累。此外,Si 的应用导致低温胁迫相关大豆冷调节基因()和()的显著上调,与非 Si 植物相比,该基因参与胁迫条件下 CBF/DREB(C 重复结合因子/脱水响应元件结合因子)基因家族的表达。本研究结果对于研究低温和 Si 补充对枣椰树形态生理生化特性的影响具有重要意义,可为在低温条件下种植植物提供一种有效的策略。