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等离子体增强碳化硅膜中的亮单自旋缺陷。

Plasmonic-Enhanced Bright Single Spin Defects in Silicon Carbide Membranes.

机构信息

CAS Key Laboratory of Quantum Information, University of Science and Technology of China, Hefei 230026, China.

CAS Center for Excellence in Quantum Information and Quantum Physics, University of Science and Technology of China, Hefei 230026, China.

出版信息

Nano Lett. 2023 May 24;23(10):4334-4343. doi: 10.1021/acs.nanolett.3c00568. Epub 2023 May 8.

Abstract

Optically addressable spin defects in silicon carbide (SiC) have emerged as attractable platforms for various quantum technologies. However, the low photon count rate significantly limits their applications. We strongly enhanced the brightness by 7 times and spin-control strength by 14 times of single divacancy defects in 4H-SiC membranes using a surface plasmon generated by gold film coplanar waveguides. The mechanism of the plasmonic-enhanced effect is further studied by tuning the distance between single defects and the surface of the gold film. A three-energy-level model is used to determine the corresponding transition rates consistent with the enhanced brightness of single defects. Lifetime measurements also verified the coupling between defects and surface plasmons. Our scheme is low-cost, without complicated microfabrication and delicate structures, which is applicable for other spin defects in different materials. This work would promote developing spin-defect-based quantum applications in mature SiC materials.

摘要

碳化硅(SiC)中的光学寻址自旋缺陷已成为各种量子技术的有吸引力的平台。然而,低光子计数率极大地限制了它们的应用。我们使用金膜共面波导产生的表面等离激元,将 4H-SiC 膜中单空位缺陷的亮度提高了 7 倍,自旋控制强度提高了 14 倍。通过调整单个缺陷与金膜表面之间的距离,进一步研究了等离子体增强效应的机制。使用三能级模型确定与单缺陷亮度增强一致的相应跃迁速率。寿命测量也验证了缺陷与表面等离激元之间的耦合。我们的方案成本低,无需复杂的微制造和精细结构,适用于不同材料中的其他自旋缺陷。这项工作将促进在成熟的 SiC 材料中基于自旋缺陷的量子应用的发展。

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