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通过相干自旋控制实现单个碳化硅色心的珀塞尔增强。

Purcell Enhancement of a Single Silicon Carbide Color Center with Coherent Spin Control.

作者信息

Crook Alexander L, Anderson Christopher P, Miao Kevin C, Bourassa Alexandre, Lee Hope, Bayliss Sam L, Bracher David O, Zhang Xingyu, Abe Hiroshi, Ohshima Takeshi, Hu Evelyn L, Awschalom David D

机构信息

Pritzker School of Molecular Engineering, University of Chicago, Chicago, Illinois 60637, United States.

Department of Physics, University of Chicago, Chicago, Illinois 60637, United States.

出版信息

Nano Lett. 2020 May 13;20(5):3427-3434. doi: 10.1021/acs.nanolett.0c00339. Epub 2020 Mar 31.

Abstract

Silicon carbide has recently been developed as a platform for optically addressable spin defects. In particular, the neutral divacancy in the 4H polytype displays an optically addressable spin-1 ground state and near-infrared optical emission. Here, we present the Purcell enhancement of a single neutral divacancy coupled to a photonic crystal cavity. We utilize a combination of nanolithographic techniques and a dopant-selective photoelectrochemical etch to produce suspended cavities with quality factors exceeding 5000. Subsequent coupling to a single divacancy leads to a Purcell factor of ∼50, which manifests as increased photoluminescence into the zero-phonon line and a shortened excited-state lifetime. Additionally, we measure coherent control of the divacancy ground-state spin inside the cavity nanostructure and demonstrate extended coherence through dynamical decoupling. This spin-cavity system represents an advance toward scalable long-distance entanglement protocols using silicon carbide that require the interference of indistinguishable photons from spatially separated single qubits.

摘要

碳化硅最近已被开发成为一种用于光学可寻址自旋缺陷的平台。特别是,4H多型中的中性双空位表现出光学可寻址的自旋-1基态和近红外光发射。在此,我们展示了与光子晶体腔耦合的单个中性双空位的珀塞尔增强效应。我们利用纳米光刻技术和掺杂剂选择性光电化学蚀刻相结合的方法来制造品质因数超过5000的悬浮腔。随后与单个双空位耦合会导致珀塞尔因子约为50,这表现为进入零声子线的光致发光增加以及激发态寿命缩短。此外,我们测量了腔纳米结构内双空位基态自旋的相干控制,并通过动态解耦展示了延长的相干性。这种自旋-腔系统代表了朝着使用碳化硅的可扩展长距离纠缠协议迈进了一步,该协议需要来自空间分离的单个量子比特的不可区分光子的干涉。

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