École Polytechnique Fédérale de Lausanne EPFL-STI-IMT-LMIS4, Station 17, Lausanne CH-1015, Switzerland.
École Polytechnique Fédérale de Lausanne EPFL-STI-IMT-NAM, Station 11, Lausanne CH-1015, Switzerland.
ACS Appl Mater Interfaces. 2023 Jul 12;15(27):33056-33064. doi: 10.1021/acsami.3c03353. Epub 2023 Jun 29.
While interference colors have been known for a long time, conventional color filters have large spatial dimensions and cannot be used to create compact pixelized color pictures. Here we report a simple yet elegant interference-based method of creating microscopic structural color pixels using a single-mask process using standard UV photolithography on an all-dielectric substrate. The technology makes use of the varied aperture-controlled physical deposition rate of low-temperature silicon dioxide inside a hollow cavity to create a thin-film stack with the controlled bottom layer thickness. The stack defines which wavelengths of the reflected light interfere constructively, and thus the cavities act as micrometer-scale pixels of a predefined color. Combinations of such pixels produce vibrant colorful pictures visible to the naked eye. Being fully CMOS-compatible, wafer-scale, and not requiring costly electron-beam lithography, such a method paves the way toward large scale applications of structural colors in commercial products.
虽然干涉色已经为人所知很长一段时间了，但传统的彩色滤光片具有较大的空间尺寸，不能用于创建紧凑的像素化彩色图片。在这里，我们报告了一种简单而优雅的基于干涉的方法，使用单个掩模工艺，在全介质衬底上使用标准的紫外光光刻技术，来创建微观结构色像素。该技术利用低温二氧化硅在中空腔内的孔径控制的物理沉积速率的变化，在具有受控底层厚度的薄膜堆叠中创建一个薄膜堆叠。该堆叠定义了反射光的哪些波长产生建设性干涉，因此腔充当预定颜色的微米级像素。这样的像素组合可以产生肉眼可见的鲜艳彩色图片。由于完全与 CMOS 兼容、晶圆级、不需要昂贵的电子束光刻，这种方法为结构色在商业产品中的大规模应用铺平了道路。
