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无缺陷少层M C T(M = V、Nb、Ta)MXene纳米片:合成、表征及物理化学性质

Defect-Free Few-Layer M C T (M = V, Nb, Ta) MXene Nanosheets: Synthesis, Characterization, and Physicochemical Properties.

作者信息

Huang Yanan, Shen Jibing, Lin Shuai, Song Wenhai, Zhu Xuebin, Sun Yuping

机构信息

Key Laboratory of Materials Physics, Institute of Solid State Physics, HFIPS, Chinese Academy of Sciences, Hefei, Anhui, 230031, P. R. China.

University of Science and Technology of China, Hefei, 230026, P. R. China.

出版信息

Adv Sci (Weinh). 2023 Oct;10(28):e2302882. doi: 10.1002/advs.202302882. Epub 2023 Aug 2.

Abstract

High-quality few-layer M C T (M = V, Nb, Ta) MXenes are very important for applications and are necessary for clarifying their physicochemical properties. However, the difficulty in etching for themselves and the existence of MC/MC and M-Al alloy impurities in their M AlC precursors seriously hinder the achievement of defect-free few-layer M C T (M = V, Nb, Ta) MXenes nanosheets. Herein, three different defect-free few-layer M C T (M = V, Nb, Ta) nanosheets are obtained by using a universal synthesis strategy of calcination, selective etching, intercalation, and exfoliation. Comprehensive characterizations confirm their defect-free few-layer structure feature, large interlayer spacing (1.702-1.955 nm), types of functional groups (-OH, -F, -O), and abundant valance states (M , M , M , M , M ). M C T (M = V, Nb, Ta) free-standing films obtained by vacuum filtration of few-layer M C T inks show good hydrophilia, high thermostability, and conductivity. A roadmap on synthesis of defect-free few-layer M C T (M = V, Nb, Ta) nanosheets are proposed and three key points are summarized. This work provides detailed guidelines for the synthesis of other defect-free few-layer MXenes nanosheets, but also will stimulate extensive functional explorations for M C T (M = V, Nb, Ta) MXenes nanosheets in the future.

摘要

高质量的少层MCT(M = V、Nb、Ta)MXenes对于应用非常重要,并且对于阐明其物理化学性质是必要的。然而,其自身蚀刻的困难以及MAlC前驱体中MC/MC和M-Al合金杂质的存在严重阻碍了无缺陷少层MCT(M = V、Nb、Ta)MXenes纳米片的制备。在此,通过使用煅烧、选择性蚀刻、插层和剥离的通用合成策略获得了三种不同的无缺陷少层MCT(M = V、Nb、Ta)纳米片。综合表征证实了它们无缺陷的少层结构特征、较大的层间距(1.702 - 1.955 nm)、官能团类型(-OH、-F、-O)以及丰富的价态(M²⁺、M³⁺、M⁴⁺、M⁵⁺、M⁶⁺)。通过对少层MCT油墨进行真空过滤获得的MCT(M = V、Nb、Ta)独立薄膜表现出良好的亲水性、高热稳定性和导电性。提出了无缺陷少层MCT(M = V、Nb、Ta)纳米片的合成路线图并总结了三个关键点。这项工作不仅为合成其他无缺陷少层MXenes纳米片提供了详细指导,还将在未来激发对MCT(M = V、Nb、Ta)MXenes纳米片的广泛功能探索。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/bdde/10558640/4b3f2d7b729a/ADVS-10-2302882-g010.jpg

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