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通过化学气相沉积法合成大面积ReS薄膜用于电阻开关的深入研究:金属电极、沟道宽度和噪声行为的影响。

Synthesis of a large area ReS thin film by CVD for in-depth investigation of resistive switching: effects of metal electrodes, channel width and noise behaviour.

作者信息

Aggarwal Pallavi, Sheoran Hardhyan, Bisht Prashant, Prasad Om Kumar, Chung Chin-Han, Chang Edward Yi, Mehta Bodh Raj, Singh Rajendra

机构信息

Department of Physics, Indian Institute of Technology Delhi, New Delhi-110016, India.

International College of Semiconductor Technology, National Yang Ming Chiao Tung University, Hsinchu City-300093, Taiwan.

出版信息

Nanoscale. 2023 Sep 1;15(34):14109-14121. doi: 10.1039/d3nr02566g.

DOI:10.1039/d3nr02566g
PMID:37581470
Abstract

The anisotropic crystal structure and layer independent electrical and optical properties of ReS make it unique among other two-dimensional materials (2DMs), emphasizing a special need for its synthesis. This work discusses the synthesis and in-depth characterization of a 1 × 1 cm large and few layered ReS film. Vibrational modes and excitonic peaks observed from the Raman and photoluminescence (PL) spectra corroborated the formation of a ReS film with a 1.26 eV bandgap. High resolution transmission electron microscopy (HRTEM) images and selected area electron diffraction (SAED) patterns inferred the polycrystalline nature of the film, while cross-sectional field emission scanning electron microscopy (FESEM) indicated planar growth with ∼10 nm thickness. The chemical composition of the film analysed through X-ray photoelectron spectroscopy (XPS) indicated the formation of a ReS film with a Re : S atomic ratio of 1 : 1.75, indicating a small amount of non-stoichiometric ReS. Following the basic characterization studies, the ReS film was tested for resistive switching (RS) device application in which the effects of different metal electrodes (Pt/Au and Ag/Au) and different channel widths (200, 100, and 50 μm) were studied. The highest memory window equal to 10 was obtained for the Ag/Au electrode while Pt/Au showed a memory window of 10. RS for the former was ascribed to the formation of a conducting filament (CF) because of the migration of Ag ions, while defect mediated charge carrier transport led to switching in the Pt/Au electrode. Furthermore, the / ratio achieved in this work (10) is also of the highest magnitude reported thus far. Furthermore, a comparison of devices with Ag/Au electrodes but with different channel widths (50, 100 and 200 μm) gave insightful results on the existence of multiple resistance states, device endurance and retention. An inverse relationship between the retention time and the device's channel width was observed, where the device with a 50 μm channel width showed a retention time of 48 hours, and the one with a 200 μm width showed stability only up to 3000 s. Furthermore, low frequency noise measurements were performed to understand the effect of defects in the low resistance state (LRS) and the high resistance state (HRS). The HRS exhibited Lorentzian noise behaviour while the LRS exhibited Lorentzian only at low current bias which converged to 1/ noise at higher current bias.

摘要

ReS的各向异性晶体结构以及与层无关的电学和光学性质使其在其他二维材料(2DMs)中独树一帜,这突出了对其进行合成的特殊需求。本文讨论了一种1×1平方厘米大的少层ReS薄膜的合成及深入表征。从拉曼光谱和光致发光(PL)光谱中观察到的振动模式和激子峰证实了具有1.26 eV带隙的ReS薄膜的形成。高分辨率透射电子显微镜(HRTEM)图像和选区电子衍射(SAED)图案推断出该薄膜的多晶性质,而横截面场发射扫描电子显微镜(FESEM)表明其具有约10纳米厚度的平面生长。通过X射线光电子能谱(XPS)分析的薄膜化学成分表明形成了Re:S原子比为1:1.75的ReS薄膜,这表明存在少量非化学计量的ReS。在进行基本表征研究之后,对ReS薄膜进行了电阻开关(RS)器件应用测试,研究了不同金属电极(Pt/Au和Ag/Au)以及不同沟道宽度(200、100和50μm)的影响。对于Ag/Au电极,获得了高达10的最高记忆窗口,而Pt/Au的记忆窗口为10。前者的电阻开关归因于Ag离子迁移导致导电细丝(CF)的形成,而缺陷介导的电荷载流子传输导致了Pt/Au电极中的开关现象。此外,本文实现的/比(10)也是迄今为止报道的最高值。此外,对具有不同沟道宽度(50、100和200μm)的Ag/Au电极器件进行比较,对于多重电阻状态、器件耐久性和保持性给出了有深刻见解的结果。观察到保持时间与器件沟道宽度之间呈反比关系,其中沟道宽度为50μm的器件保持时间为48小时,而宽度为200μm的器件仅在3000秒内保持稳定。此外,进行了低频噪声测量以了解低电阻状态(LRS)和高电阻状态(HRS)下缺陷的影响。高电阻状态呈现洛伦兹噪声行为,而低电阻状态仅在低电流偏置下呈现洛伦兹噪声,在高电流偏置下收敛到1/噪声。

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