Ouaj Taoufiq, Kramme Leonard, Metzelaars Marvin, Li Jiahan, Watanabe Kenji, Taniguchi Takashi, Edgar James H, Beschoten Bernd, Kögerler Paul, Stampfer Christoph
JARA-FIT and 2nd Institute of Physics, RWTH Aachen University, D-52074 Aachen, Germany.
Institute of Inorganic Chemistry, RWTH Aachen University, D-52056, Aachen, Germany.
Nanotechnology. 2023 Sep 6;34(47). doi: 10.1088/1361-6528/acf2a0.
In this work, we report on the growth of hexagonal boron nitride (hBN) crystals from an iron flux at atmospheric pressure and high temperature and demonstrate that (i) the entire sheet of hBN crystals can be detached from the metal in a single step using hydrochloric acid and that (ii) these hBN crystals allow to fabricate high carrier mobility graphene-hBN devices. By combining spatially-resolved confocal Raman spectroscopy and electrical transport measurements, we confirm the excellent quality of these crystals for high-performance hBN-graphene-based van der Waals heterostructures. The full width at half maximum of the graphene Raman 2D peak is as low as 16 cm, and the room temperature charge carrier mobilitiy is around 80 000 cm/(Vs) at a carrier density 1 × 10cm. This is fully comparable with devices of similar dimensions fabricated using crystalline hBN synthesized by the high pressure and high temperature method. Finally, we show that for exfoliated high-quality hBN flakes with a thickness between 20 and 40 nm the line width of the hBN Raman peak, in contrast to the graphene 2D line width, is not useful for benchmarking hBN in high mobility graphene devices.
在这项工作中,我们报道了在常压和高温下通过铁助熔剂生长六方氮化硼(hBN)晶体,并证明:(i)使用盐酸可一步将整片hBN晶体从金属上分离下来;(ii)这些hBN晶体可用于制造高载流子迁移率的石墨烯-hBN器件。通过结合空间分辨共焦拉曼光谱和电输运测量,我们证实了这些晶体对于基于hBN-石墨烯的高性能范德华异质结构具有优异的品质。石墨烯拉曼2D峰的半高宽低至16 cm,在载流子密度为1×10cm时,室温下的电荷载流子迁移率约为80000 cm²/(Vs)。这与使用高压高温法合成的结晶hBN制造的类似尺寸器件完全可比。最后,我们表明,对于厚度在20至40 nm之间的剥离高质量hBN薄片,与石墨烯2D线宽不同,hBN拉曼峰的线宽对于在高迁移率石墨烯器件中对hBN进行基准测试并无用处。