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通过选择性区域再生实现的单片集成全氮化镓基微发光二极管显示器

Monolithic integrated all-GaN-based µLED display by selective area regrowth.

作者信息

Liu Yaying, Liu Zhaojun, Lau Kei May

出版信息

Opt Express. 2023 Sep 11;31(19):31300-31307. doi: 10.1364/OE.502275.

Abstract

This work demonstrates an all-GaN-based µLED display with monolithic integrated HEMT and µLED pixels using the selective area regrowth method. The monochrome µLED-HEMT display has a resolution of 20 × 20 and a pixel pitch of 80 µm. With the optimized regrowth pattern, the µLED-HEMT achieves a maximum light output power of 36.2 W/cm and a peak EQE of 3.36%, mainly due to the improved crystal quality of regrown µLED. TMAH treatment and AlO surface passivation are also performed to minimize the impact of nonradiative recombination caused by the dry etching damage. With a custom-designed driving circuit board, images of "HKUST" are successfully shown on the µLED-HEMT display.

摘要

这项工作展示了一种基于全氮化镓的微发光二极管(µLED)显示器,它采用选择性区域再生长方法,将高电子迁移率晶体管(HEMT)与µLED像素进行了单片集成。该单色µLED-HEMT显示器的分辨率为20×20,像素间距为80µm。通过优化的再生长模式,µLED-HEMT实现了36.2W/cm的最大光输出功率和3.36%的峰值外量子效率(EQE),这主要得益于再生长µLED晶体质量的提高。还进行了四甲基氢氧化铵(TMAH)处理和氧化铝(AlO)表面钝化,以尽量减少干法刻蚀损伤引起的非辐射复合的影响。通过定制设计的驱动电路板,“香港科技大学”的图像成功显示在µLED-HEMT显示器上。

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