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一种具有低漏电流的高度集成非易失性双向射频场效应晶体管。

A highly integrated nonvolatile bidirectional RFET with low leakage current.

作者信息

Liu Xi, Li Mengmeng, Zhang Shouqiang, Jin Xiaoshi

机构信息

School of Information Science and Engineering, Shenyang University of Technology, Shenyang 110870, China.

出版信息

Heliyon. 2023 Aug 28;9(9):e19298. doi: 10.1016/j.heliyon.2023.e19298. eCollection 2023 Sep.

DOI:10.1016/j.heliyon.2023.e19298
PMID:37809891
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC10558334/
Abstract

A highly integrated nonvolatile bidirectional reconfigurable FET controlled by a single gate (SGCN-BRFET) is proposed. The nonvolatile function, the bidirectional function and the reconfigurable function can be achieved at the same time. Instead of the independently powered program gate (PG) of BRFET, the program operation of the proposed SGCN-BRFET can be independently completed by the control gate (CG) itself through storing positive or negative charges in a floating program gate (FPG) formed on both source/drain sides. Thereafter, the interconnection can be simplified. The conduction type of the SGCN-BRFET is reconfigured by programming the FPG with different type of charges into the FPG. By optimizing the quantities of the stored charges, the FPG effective voltage can be changed to achieve higher forward current and lower leakage current. The physical mechanism of the proposed SGCN-RFET has been systematically analyzed. The device performance has been compared with BRFET. The influence of the amount of charge to the device performance has also been discussed in detail.

摘要

提出了一种由单栅极控制的高度集成的非易失性双向可重构场效应晶体管(SGCN-BRFET)。该器件可同时实现非易失性功能、双向功能和可重构功能。与BRFET的独立供电编程栅极(PG)不同,所提出的SGCN-BRFET的编程操作可由控制栅极(CG)自身通过在源极/漏极两侧形成的浮置编程栅极(FPG)中存储正电荷或负电荷来独立完成。此后,互连可得到简化。通过向FPG中注入不同类型的电荷对其进行编程,可重构SGCN-BRFET的导电类型。通过优化存储电荷的数量,可改变FPG有效电压,以实现更高的正向电流和更低的漏电流。对所提出的SGCN-RFET的物理机制进行了系统分析。将该器件的性能与BRFET进行了比较。还详细讨论了电荷量对器件性能的影响。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/f809/10558334/53bed959db7d/gr9.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/f809/10558334/50f31324fc58/gr1a.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/f809/10558334/404042c0676a/gr2.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/f809/10558334/6893a5234f62/gr3.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/f809/10558334/ecc07e718a87/gr4.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/f809/10558334/4c05ac3e7dc4/gr5.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/f809/10558334/3f0bfac99754/gr6.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/f809/10558334/5086cd5887a2/gr7.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/f809/10558334/5482d905c04d/gr8.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/f809/10558334/53bed959db7d/gr9.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/f809/10558334/50f31324fc58/gr1a.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/f809/10558334/404042c0676a/gr2.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/f809/10558334/6893a5234f62/gr3.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/f809/10558334/ecc07e718a87/gr4.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/f809/10558334/4c05ac3e7dc4/gr5.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/f809/10558334/3f0bfac99754/gr6.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/f809/10558334/5086cd5887a2/gr7.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/f809/10558334/5482d905c04d/gr8.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/f809/10558334/53bed959db7d/gr9.jpg

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本文引用的文献

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A High-Performance Rectangular Gate U Channel FETs with Only 2-nm Distance between Source and Drain Contacts.一种源极和漏极触点之间间距仅为2纳米的高性能矩形栅极U型沟道场效应晶体管。
Nanoscale Res Lett. 2019 Feb 4;14(1):43. doi: 10.1186/s11671-019-2879-0.
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Nature. 2013 Sep 26;501(7468):526-30. doi: 10.1038/nature12502.
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Reconfigurable silicon nanowire transistors.可重构硅纳米线晶体管。
Nano Lett. 2012 Jan 11;12(1):119-24. doi: 10.1021/nl203094h. Epub 2011 Dec 1.