Gu Yan, Xu Xingwang, Lin Jieqiong, Guo Zhuoyi, Xu Zisu, Chen Hongyu, Zhao Huibo, Fu Bin, Kang Mingshuo
Jilin Provincial Key Laboratory of Micro-Nano and Ultra-Precision Manufacturing, School of Mechatronic Engineering, Changchun University of Technology, Yan'an Ave 2055, Changchun, Jilin 130012, PR China.
Jilin Provincial Key Laboratory of International Science and Technology Cooperation for High Performance Manufacturing and Testing, School of Mechatronic Engineering, Changchun University of Technology, Yan'an Ave 2055, Changchun, Jilin 130012, PR China.
Langmuir. 2024 Feb 13;40(6):3035-3052. doi: 10.1021/acs.langmuir.3c03228. Epub 2024 Jan 30.
The problems of low polishing efficiency and serious surface damage in the processing of silicon carbide (SiC) ceramics are well-known. In view of the above problems, a new method of photocatalytic vibration composite polishing (PVCP) combined with a compound control strategy was proposed. A vibration-assisted device was developed, and a compound control system was designed for the device to improve the trajectory tracking accuracy. Experiments were carried out to verify the effectiveness of the vibration-assisted device and the compound control system. In addition, methyl orange degradation and fading experiments, redox potential measurement experiments, and SiC ceramic surface hardness characterization experiments were carried out to reveal the effects of vibration and photocatalytic parameters on polishing solution oxidation and SiC ceramic surface mechanical properties. Finally, the effects of photocatalysis, vibration frequency, amplitude, and the compound control system on the polishing effect were analyzed. The results show that when the UV intensity is 100%, the polishing force is 3-4N, the vibration frequency is 400 Hz, the amplitude is 15 μm, and the surface roughness of SiC ceramics is reduced by about 11 nm after the introduction of the compound control system, which verifies the effectiveness of the combination of the compound control system and PVCP.
碳化硅（SiC）陶瓷加工过程中存在抛光效率低和表面损伤严重的问题，这是众所周知的。针对上述问题，提出了一种结合复合控制策略的光催化振动复合抛光（PVCP）新方法。开发了一种振动辅助装置，并为该装置设计了复合控制系统，以提高轨迹跟踪精度。进行实验以验证振动辅助装置和复合控制系统的有效性。此外，还进行了甲基橙降解和褪色实验、氧化还原电位测量实验以及SiC陶瓷表面硬度表征实验，以揭示振动和光催化参数对抛光液氧化和SiC陶瓷表面机械性能的影响。最后，分析了光催化、振动频率、振幅和复合控制系统对抛光效果的影响。结果表明，当紫外光强度为100%、抛光力为3 - 4N、振动频率为400Hz、振幅为15μm时，引入复合控制系统后SiC陶瓷的表面粗糙度降低了约11nm，这验证了复合控制系统与PVCP相结合的有效性。
