Obare Nancy, Isoe Wycliffe, Nalianya Amos, Mageto Maxwell, Odari Victor
Department of Physics, Masinde Muliro University of Science and Technology, P.O Box 190-50100, Kakamega, Kenya.
Materials Research Society of Kenya, P.O. Box 15653-00503, Nairobi, Kenya.
Heliyon. 2024 Feb 22;10(5):e26896. doi: 10.1016/j.heliyon.2024.e26896. eCollection 2024 Mar 15.
Copper antimony sulphide thin films are promising, less toxic, and more absorbent material in the world, and they would be good to be applied in photovoltaic energy production. To better operations of copper antimony sulphide (CuSbS) photovoltaic cells, this paper uses a solar cell capacitance simulator (SCAPS-1D) to simulate and analyze photovoltaic properties. This article examines different thicknesses of fluorine-doped tin oxide (FTO), cadmium sulphide (CdS), carbon (C), and CuSbS, as well as the defect and dopant concentration in the CuSbS photoactive layer of the photovoltaic cell structure glass/FTO/n-CdS/p-CuSbS/C/Au. Optimum thicknesses of CuSbS is 300 nm, carbon hole transport layer (HTL) is 50 nm, and for n-CdS electron transport layer (ETL) is 100 nm, giving open circuit Voltage (Voc) of 0.9389 V, short circuit current density (Jsc) of 28.32 mA/cm, fill factor (FF) of 60.8% and solar cell efficiency of 16.17%. The increase in defects causes a decrease of carrier lifetime resulting in to decrease in diffusion length and the optimum absorber layer doping concentration was found to be 10 cm.
硫化铜锑薄膜是一种很有前景、毒性较小且吸收性更强的材料,在光伏能源生产中具有良好的应用前景。为了更好地运行硫化铜锑(CuSbS)光伏电池,本文使用太阳能电池电容模拟器(SCAPS-1D)对其光伏特性进行模拟和分析。本文研究了不同厚度的氟掺杂氧化锡(FTO)、硫化镉(CdS)、碳(C)和CuSbS,以及光伏电池结构玻璃/FTO/n-CdS/p-CuSbS/C/Au中CuSbS光活性层的缺陷和掺杂剂浓度。CuSbS的最佳厚度为300nm,碳空穴传输层(HTL)为50nm,n-CdS电子传输层(ETL)为100nm,开路电压(Voc)为0.9389V,短路电流密度(Jsc)为28.32mA/cm,填充因子(FF)为60.8%,太阳能电池效率为16.17%。缺陷的增加会导致载流子寿命缩短,从而使扩散长度减小,最佳吸收层掺杂浓度为10cm。