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二维莫尔半导体异质双层中的导带复制品

Conduction Band Replicas in a 2D Moiré Semiconductor Heterobilayer.

作者信息

Graham Abigail J, Park Heonjoon, Nguyen Paul V, Nunn James, Kandyba Viktor, Cattelan Mattia, Giampietri Alessio, Barinov Alexei, Watanabe Kenji, Taniguchi Takashi, Andreev Anton, Rudner Mark, Xu Xiaodong, Wilson Neil R, Cobden David H

机构信息

Department of Physics, University of Warwick, Coventry CV4 7AL, U.K.

Department of Physics, University of Washington, Seattle, Washington 98195, United States.

出版信息

Nano Lett. 2024 May 1;24(17):5117-5124. doi: 10.1021/acs.nanolett.3c04866. Epub 2024 Apr 17.

DOI:10.1021/acs.nanolett.3c04866
PMID:38629940
Abstract

Stacking monolayer semiconductors creates moiré patterns, leading to correlated and topological electronic phenomena, but measurements of the electronic structure underpinning these phenomena are scarce. Here, we investigate the properties of the conduction band in moiré heterobilayers of WS/WSe using submicrometer angle-resolved photoemission spectroscopy with electrostatic gating. We find that at all twist angles the conduction band edge is the -point valley of the WS, with a band gap of 1.58 ± 0.03 eV. From the resolved conduction band dispersion, we deduce an effective mass of 0.15 ± 0.02 . Additionally, we observe replicas of the conduction band displaced by reciprocal lattice vectors of the moiré superlattice. We argue that the replicas result from the moiré potential modifying the conduction band states rather than final-state diffraction. Interestingly, the replicas display an intensity pattern with reduced 3-fold symmetry, which we show implicates the pseudo vector potential associated with in-plane strain in moiré band formation.

摘要

堆叠单层半导体可产生莫尔条纹图案,从而导致相关的和拓扑电子现象,但对支撑这些现象的电子结构的测量却很少。在此,我们使用带有静电门控的亚微米角分辨光电子能谱研究了WS/WSe莫尔异质双层中导带的性质。我们发现,在所有扭转角度下,导带边缘都是WS的Γ点谷,带隙为1.58±0.03电子伏特。从解析的导带色散中,我们推导出有效质量为0.15±0.02。此外,我们观察到导带的副本被莫尔超晶格的倒易晶格矢量所位移。我们认为,这些副本是由莫尔势修改导带状态而非终态衍射导致的。有趣的是,这些副本显示出具有降低的三重对称性的强度图案,我们表明这暗示了与莫尔带形成中的面内应变相关的赝矢量势。

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