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通过波前传播模拟对美国国家航空航天局(NASA)的X射线/极紫外光刻设备进行评估。 (注:这里的AS根据语境推测可能是指美国国家航空航天局NASA,若实际不是该意思,请根据准确信息调整)

Evaluation of the X-ray/EUV Nanolithography Facility at AS through wavefront propagation simulations.

作者信息

Knappett Jerome B M, Haydon Blair, Cowie Bruce C C, Kewish Cameron M, van Riessen Grant A

机构信息

Department of Mathematical and Physical Sciences, School of Computing, Engineering and Mathematical Sciences, La Trobe University, Bundoora, Victoria 3086, Australia.

Australian Synchrotron, Australian Nuclear Science and Technology Organisation (ANSTO), Clayton, Victoria 3168, Australia.

出版信息

J Synchrotron Radiat. 2024 May 1;31(Pt 3):485-492. doi: 10.1107/S1600577524002534. Epub 2024 Apr 17.

DOI:10.1107/S1600577524002534
PMID:38630438
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC11075725/
Abstract

Synchrotron light sources can provide the required spatial coherence, stability and control to support the development of advanced lithography at the extreme ultraviolet and soft X-ray wavelengths that are relevant to current and future fabricating technologies. Here an evaluation of the optical performance of the soft X-ray (SXR) beamline of the Australian Synchrotron (AS) and its suitability for developing interference lithography using radiation in the 91.8 eV (13.5 nm) to 300 eV (4.13 nm) range are presented. A comprehensive physical optics model of the APPLE-II undulator source and SXR beamline was constructed to simulate the properties of the illumination at the proposed location of a photomask, as a function of photon energy, collimation and monochromator parameters. The model is validated using a combination of experimental measurements of the photon intensity distribution of the undulator harmonics. It is shown that the undulator harmonics intensity ratio can be accurately measured using an imaging detector and controlled using beamline optics. Finally, the photomask geometric constraints and achievable performance for the limiting case of fully spatially coherent illumination are evaluated.

摘要

同步辐射光源能够提供所需的空间相干性、稳定性和控制能力,以支持在与当前及未来制造技术相关的极紫外和软X射线波长下开展先进光刻技术的研发。本文介绍了对澳大利亚同步加速器(AS)软X射线(SXR)光束线的光学性能评估,以及其在91.8电子伏特(13.5纳米)至300电子伏特(4.13纳米)范围内利用辐射开展干涉光刻的适用性。构建了APPLE-II波荡器光源和SXR光束线的综合物理光学模型,以模拟在光掩模提议位置处照明的特性,该特性是光子能量、准直和单色仪参数的函数。通过对波荡器谐波光子强度分布进行实验测量相结合的方式对该模型进行了验证。结果表明,波荡器谐波强度比可使用成像探测器精确测量,并可通过光束线光学元件进行控制。最后,评估了光掩模的几何约束以及在完全空间相干照明的极限情况下可实现的性能。

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本文引用的文献

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Multilayer Reflective Coatings for BEUV Lithography: A Review.用于极紫外光刻的多层反射涂层:综述
Nanomaterials (Basel). 2021 Oct 20;11(11):2782. doi: 10.3390/nano11112782.
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High-efficiency diffraction gratings for EUV and soft x-rays using spin-on-carbon underlayers.使用旋涂碳底层的用于极紫外和软X射线的高效衍射光栅。
Nanotechnology. 2021 Nov 15;33(6). doi: 10.1088/1361-6528/ac328b.
3
Analysis of partially coherent light propagation through the soft X-ray interference lithography beamline at SSRF.部分相干光通过上海光源软X射线干涉光刻光束线传播的分析。
J Synchrotron Radiat. 2021 May 1;28(Pt 3):902-909. doi: 10.1107/S1600577521003398. Epub 2021 Apr 14.
4
Model-based correction algorithm for Fourier Transform infrared microscopy measurements of complex tissue-substrate systems.基于模型的复杂组织-基底系统傅里叶变换红外显微镜测量的校正算法。
Anal Chim Acta. 2020 Mar 22;1103:143-155. doi: 10.1016/j.aca.2019.12.070. Epub 2020 Jan 3.
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Opt Express. 2019 Sep 30;27(20):28750-28759. doi: 10.1364/OE.27.028750.
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Nanoscale. 2015 Apr 28;7(16):7386-93. doi: 10.1039/c5nr00565e.
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Sci Rep. 2015 Mar 18;5:9235. doi: 10.1038/srep09235.
8
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Phys Rev Lett. 2012 Nov 9;109(19):194801. doi: 10.1103/PhysRevLett.109.194801. Epub 2012 Nov 8.
9
Stand-alone diamond binary phase transmission gratings for the EUV band.
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