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角向偏移多线色散光学相控阵实现大视场和平顶包络。

Angularly offset multiline dispersive optical phased array enabling large field of view and plateau envelope.

作者信息

Wang Chenxi, Lee Woo-Bin, Sunwoo Yoon-Ho, Kwon Yun-Jae, Oh Min-Cheol, Lee Sang-Shin

出版信息

Opt Express. 2024 Apr 8;32(8):13048-13064. doi: 10.1364/OE.515498.

DOI:10.1364/OE.515498
PMID:38859285
Abstract

We propose and demonstrate an angularly offset multiline (AOML) dispersive silicon nitride optical phased array (OPA) that enables efficient line beam scanning with an expanded field of view (FOV) and plateau envelope. The suggested AOML OPA incorporates multiline OPA units, which were seamlessly integrated with a 45° angular offset through a thermo-optic switch based on a multimode interference coupler, resulting in a wide FOV that combines three consecutive scanning ranges. Simultaneously, a periodic diffraction envelope rendered by the multiline OPA units contributes to reduced peak intensity fluctuation of the main lobe across the large FOV. An expedient polishing enabling the angled facet was diligently accomplished through the implementation of oblique polishing techniques applied to the 90° angle of the chip. For each dispersive OPA unit, we engineered an array of delay lines with progressively adjustable delay lengths, enabling a passive wavelength-tunable beam scanning. Experimental validation of the proposed OPA revealed efficient beam scanning, achieved by wavelength tuning from 1530 to 1600 nm and seamless switching between multiline OPAs, yielding an FOV of 152° with a main lobe intensity fluctuation of 2.8 dB. The measured efficiency of dispersive scanning was estimated at 0.97°/nm, as intended.

摘要

我们提出并展示了一种角偏移多线(AOML)色散氮化硅光学相控阵(OPA),它能够实现具有扩展视场(FOV)和平坦包络的高效线光束扫描。所建议的AOML OPA包含多线OPA单元,这些单元通过基于多模干涉耦合器的热光开关以45°角偏移无缝集成,从而形成一个结合了三个连续扫描范围的宽视场。同时,多线OPA单元产生的周期性衍射包络有助于降低在大视场内主瓣的峰值强度波动。通过对芯片90°角应用倾斜抛光技术,精心完成了便于形成倾斜面的抛光。对于每个色散OPA单元,我们设计了一系列具有逐渐可调延迟长度的延迟线,实现了无源波长可调光束扫描。对所提出的OPA进行的实验验证表明,通过从1530至1600 nm的波长调谐以及多线OPA之间的无缝切换实现了高效光束扫描,视场为152°,主瓣强度波动为2.8 dB。如预期的那样,测得的色散扫描效率估计为0.97°/nm。

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