Zhao Xinjia, Lv Chengbao, Song Shuanqiang, Zhao Meng, Ji Jing
Research Center for Applied Mechanics, School of Electro-Mechanical Engineering, Xidian University, No.2 South TaibaiRoad, Xi'an 710071, China.
Shaanxi Key Laboratory of Space Extreme Detection, Xi'an 710071, China.
Micromachines (Basel). 2024 Jun 8;15(6):768. doi: 10.3390/mi15060768.
This paper proposes a method for classifying crystal planes based on the bond angle characteristics of quartz unit cells and constructs an etch rate model for quartz crystal planes at both macro and micro scales. By omitting oxygen atoms from the quartz cell structure, a method based on bond angle characteristics was established to partition the atomic arrangement of the crystal surface. This approach was used to analyze the etching processes of typical quartz crystal planes (R, r, m, and (0001)), approximating the etching process of crystals as a cyclic removal of certain bond angle characteristics on the crystal planes. This led to the development of an etch rate model based on micro-geometric parameters of crystal planes. Additionally, using the proposed bond angle classification method, the common characteristics of atomic configurations on the crystal plane surfaces within the X_cut type were extracted and classified into seven regions, further expanding and applying the etch rate model. The computational results of this model showed good agreement with experimental data, indicating the rationality and feasibility of the proposed method. These also provide a theoretical basis for understanding the microstructural changes during quartz-based MEMS etching processes.
本文提出了一种基于石英晶胞键角特征对晶面进行分类的方法，并构建了宏观和微观尺度下石英晶面的蚀刻速率模型。通过从石英晶胞结构中省略氧原子，建立了一种基于键角特征的方法来划分晶体表面的原子排列。该方法用于分析典型石英晶面（R、r、m和(0001)）的蚀刻过程，将晶体的蚀刻过程近似为晶体平面上某些键角特征的循环去除。这导致了基于晶面微观几何参数的蚀刻速率模型的发展。此外，利用所提出的键角分类方法，提取了X切型内晶面表面原子构型的共同特征，并将其分为七个区域，进一步扩展和应用了蚀刻速率模型。该模型的计算结果与实验数据吻合良好，表明了所提方法的合理性和可行性。这些也为理解基于石英的微机电系统蚀刻过程中的微观结构变化提供了理论基础。
