Zhao Wenyong, Zhou Hong, Li Jiahao, Lu Yuchen, Ding Yuqiang
International Joint Research Center for Photoresponsive Molecules and Materials, School of Chemical and Material Engineering, Jiangnan University, 1800 Lihu Road, Wuxi 214122, China.
Molecules. 2024 Jun 23;29(13):2987. doi: 10.3390/molecules29132987.
In this paper, four heteroleptic Ce(III) complexes, including Ce(thd)-phen (thd = 2,2,6,6-tetramethyl-3,5-heptanedione, phen = 1, 10-phenanthroline (), Ce(thd)-MEDA (MEDA = N-Methylethylenediamine (), Ce(thd)-MOMA (MOMA = N-(2-Methoxyethyl)methylamine (), and Ce(thd)-DMDE (DMDE = ,″-dimethyl ethanol amine (), were synthesized and characterized with H-NMR, elemental analysis, and X-ray single-crystal diffraction. The thermogravimetric analysis and vapor pressure results indicated that the complexing ability of a nitrogen-containing bidentate ligand with a cerium ion was stronger than that of a mixed oxygen-nitrogen-containing bidentate ligand. Complex was selected as an ALD precursor to deposit a CeO film on a SiO/Si (100) wafer. The self-limited deposition results demonstrated that complex was a potential ALD precursor.
在本文中,合成了四种异核铈(III)配合物,包括Ce(thd)-phen(thd = 2,2,6,6-四甲基-3,5-庚二酮,phen = 1,10-菲咯啉)、Ce(thd)-MEDA(MEDA = N-甲基乙二胺)、Ce(thd)-MOMA(MOMA = N-(2-甲氧基乙基)甲胺)和Ce(thd)-DMDE(DMDE = 二甲基乙醇胺),并通过氢核磁共振(H-NMR)、元素分析和X射线单晶衍射对其进行了表征。热重分析和蒸气压结果表明,含氮双齿配体与铈离子的络合能力强于含氮氧混合双齿配体。选择配合物作为原子层沉积(ALD)前驱体,在SiO/Si(100)晶片上沉积CeO薄膜。自限性沉积结果表明配合物是一种潜在的ALD前驱体。