Hu Jiayang, Li Hanxi, Chen Anzhe, Zhang Yishu, Wang Hailiang, Fu Yu, Zhou Xin, Loh Kian Ping, Kang Yu, Chai Jian, Wang Chenhao, Zhou Jiachao, Miao Jialei, Zhao Yuda, Zhong Shuai, Zhao Rong, Liu Kaihui, Xu Yang, Yu Bin
College of Integrated Circuits, Zhejiang University, Hangzhou, Zhejiang 311200, China.
ZJU-Hangzhou Global Scientific and Technological Innovation Center, Hangzhou, Zhejiang 311200, China.
ACS Nano. 2024 Jul 29. doi: 10.1021/acsnano.4c03856.
The Boltzmann Tyranny, set by thermionic statistics, dictates the lower limit of switching slope (SS) of a MOSFET to be 60 mV/dec, the fundamental barrier for low-dissipative electronics. The large SS leads to nonscalable voltage, significant leakage, and power consumption, particularly at short channels, making transistor scaling an intimidating challenge. In recent decades, an array of steep-slope transistors has been proposed; none is close to an ideal switch with ultimately abrupt switching (SS ∼ 0 mV/dec) between the binary logic states. We demonstrated an all-2D-materials van-der-Waals-heterostructure (vdW)-based FET that exhibits ultrasteep switching (0.33 mV/dec), a large on/off current ratio (∼10), and an ultralow off current (∼0.1 pA). The "Subthreshold-Free" operation achieved by the collective behavior of functional materials enables FET switching directly from the OFF-state to the ON-state with entirely eliminated subthreshold region, behaving as the ideal logic switch. Two-inch wafer-scale device fabrication is demonstrated. Boosted by device innovation and emerging materials, the research presents an advancement in achieving the "beyond-Boltzmann" transistors, overcoming one of the CMOS electronics' most infamous technology barriers that have plagued the research community for decades.
由热电子统计设定的玻尔兹曼暴政规定,MOSFET开关斜率(SS)的下限为60 mV/十倍频程,这是低功耗电子学的基本障碍。大的开关斜率会导致电压不可扩展、显著的漏电和功耗,特别是在短沟道情况下,这使得晶体管按比例缩小成为一项艰巨的挑战。近几十年来,人们提出了一系列陡坡晶体管;但没有一种接近理想开关,能在二进制逻辑状态之间实现最终的突然切换(SS ∼ 0 mV/十倍频程)。我们展示了一种基于全二维材料范德华异质结构(vdW)的场效应晶体管,它表现出超陡的开关特性(0.33 mV/十倍频程)、大的开/关电流比(∼10)和超低的关态电流(∼0.1 pA)。通过功能材料的集体行为实现的“无亚阈值”操作使场效应晶体管能够直接从关态切换到开态,完全消除了亚阈值区域,表现为理想的逻辑开关。展示了两英寸晶圆规模的器件制造。在器件创新和新兴材料的推动下,该研究在实现“超越玻尔兹曼”晶体管方面取得了进展,克服了困扰研究界数十年的CMOS电子学最臭名昭著的技术障碍之一。