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基于负电容的亚60 mV/十倍频程亚阈值摆幅氧化铟纳米线场效应晶体管及其逻辑应用

InO Nanowire Field-Effect Transistors with Sub-60 mV/dec Subthreshold Swing Stemming from Negative Capacitance and Their Logic Applications.

作者信息

Xu Qian, Liu Xingqiang, Wan Bensong, Yang Zheng, Li Fangtao, Lu Junfeng, Hu Guofeng, Pan Caofeng, Wang Zhong Lin

机构信息

CAS Center for Excellence in Nanoscience, Beijing Key Laboratory of Micro-nano Energy and Sensor , Beijing Institute of Nanoenergy and Nanosystems, Chinese Academy of Sciences , Beijing 100083 , P. R. China.

School of Nanoscience and Technology , University of Chinese Academy of Sciences , Beijing 100049 , P. R. China.

出版信息

ACS Nano. 2018 Sep 25;12(9):9608-9616. doi: 10.1021/acsnano.8b05604. Epub 2018 Sep 10.

Abstract

Heat dissipation is a key issue for scaling metal-oxide-semiconductor field-effect transistors (MOSFETs). The Boltzmann distribution of electrons imposes a physical limit on the subthreshold swing (SS), which impedes both the reduction of the switching energy and the further increase of the device density. The negative capacitance effect is proposed to rescue MOSFETs from this phenomenon called "Boltzmann tyranny". Herein, we report InO nanowire (NW) transistors with SS values in the sub-60 mV/dec region, which utilize the ferroelectric P(VDF-TrFE) as the dielectric layer. An ultralow SS down to ∼10 mV/dec is observed and spans over 5 orders of magnitude in the drain current. Meanwhile, a high on/off ratio of more than 10 and a transconductance ( g) of 2.3 μS are obtained simultaneously at V = 0.1 V. The results can be understood by the "voltage amplification" effect induced from the negative capacitance effect. Moreover, the steep slope FET-based inverters indicate a high voltage gain of 41.6. In addition to the NOR and NAND gates, the Schmitt trigger inverters containing only one steep slope FET are demonstrated. This work demonstrates an avenue for low-power circuit design with a steep SS.

摘要

散热是金属氧化物半导体场效应晶体管(MOSFET)缩放的关键问题。电子的玻尔兹曼分布对亚阈值摆幅(SS)施加了物理限制,这既阻碍了开关能量的降低,也阻碍了器件密度的进一步提高。提出了负电容效应来将MOSFET从这种称为“玻尔兹曼暴政”的现象中解救出来。在此,我们报道了InO纳米线(NW)晶体管,其SS值在亚60 mV/dec区域,该晶体管利用铁电P(VDF-TrFE)作为介电层。观察到低至约10 mV/dec的超低SS,并且在漏极电流中跨越5个数量级。同时,在V = 0.1 V时,同时获得了大于10的高开/关比和2.3 μS的跨导(g)。这些结果可以通过负电容效应引起的“电压放大”效应来理解。此外,基于陡坡场效应晶体管的反相器显示出41.6的高电压增益。除了或非门和与非门外,还展示了仅包含一个陡坡场效应晶体管的施密特触发反相器。这项工作展示了一种用于具有陡峭SS的低功耗电路设计的途径。

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