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六方氮化硼中缺陷发射的大规模统计分析:揭示光谱家族和薄片形态的影响

Large-Scale Statistical Analysis of Defect Emission in hBN: Revealing Spectral Families and Influence of Flake Morphology.

作者信息

Islam Md Samiul, Chowdhury Rup Kumar, Barthelemy Marie, Moczko Loic, Hebraud Pascal, Berciaud Stephane, Barsella Alberto, Fras Francois

机构信息

Institut de Physique et Chimie des Matériaux de Strasbourg, Université de Strasbourg, CNRS, UMR 7504, F-67000 Strasbourg, France.

出版信息

ACS Nano. 2024 Aug 13;18(32):20980-20989. doi: 10.1021/acsnano.3c10403. Epub 2024 Jul 31.

DOI:10.1021/acsnano.3c10403
PMID:39083640
Abstract

Quantum emitters in two-dimensional layered hexagonal boron nitride are quickly emerging as a highly promising platform for next-generation quantum technologies. However, the precise identification and control of defects are key parameters to achieve the next step in their development. We conducted a comprehensive study by analyzing over 10,000 photoluminescence emission lines from liquid exfoliated hBN nanoflake samples, revealing 11 narrow sets of defect families within the 1.6 to 2.2 eV energy range. This challenges hypotheses of a random energy distribution. We also reported averaged defect parameters, including emission line widths, spatial density, phonon side bands, and Franck-Condon-related factors. These findings provide valuable insights into deciphering the microscopic origin of emitters in hBN hosts. We also explored the influence of the hBN host morphology on defect family formation, demonstrating its crucial impact. By tuning the flake size and arrangement, we achieve selective control of defect types while maintaining high spatial density. This offers a scalable approach to defect emission control, diverging from costly engineering methods. It emphasizes the significance of the morphological aspects of hBN hosts for gaining insights into defect origins and expanding their spectral control.

摘要

二维层状六方氮化硼中的量子发射器正迅速成为下一代量子技术极具前景的平台。然而,缺陷的精确识别和控制是实现其进一步发展的关键参数。我们通过分析液体剥离的hBN纳米片样品的10000多条光致发光发射线进行了全面研究,在1.6至2.2 eV能量范围内揭示了11组狭窄的缺陷家族。这对随机能量分布的假设提出了挑战。我们还报告了平均缺陷参数,包括发射线宽度、空间密度、声子边带和弗兰克 - 康登相关因素。这些发现为解读hBN主体中发射器的微观起源提供了有价值的见解。我们还探讨了hBN主体形态对缺陷家族形成的影响,证明了其关键作用。通过调整薄片尺寸和排列,我们在保持高空间密度的同时实现了对缺陷类型的选择性控制。这提供了一种可扩展的缺陷发射控制方法,有别于成本高昂的工程方法。它强调了hBN主体形态方面对于深入了解缺陷起源和扩展其光谱控制的重要性。

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Large-Scale Statistical Analysis of Defect Emission in hBN: Revealing Spectral Families and Influence of Flake Morphology.六方氮化硼中缺陷发射的大规模统计分析:揭示光谱家族和薄片形态的影响
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