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氮化镓中的碳和硅杂质缺陷:基于第一性原理模拟单光子发射器

Carbon and Silicon Impurity Defects in GaN: Simulating Single-Photon Emitters by First Principles.

作者信息

Yuan Junxiao, Du Jinglei, Hou Yidong, Chen Feiliang, Li Qian

机构信息

Department of Physics, Sichuan University, Chengdu 610065, China.

Microsystem and Terahertz Research Center, China Academy of Engineering Physics, Chengdu 610299, China.

出版信息

Materials (Basel). 2024 Aug 1;17(15):3788. doi: 10.3390/ma17153788.

Abstract

Defect single-photon emitters (SPE) in gallium nitride (GaN) have garnered great attentions in recent years due to the advantages they offer, including the ability to operate at room temperature, narrow emission linewidths, and high brightness. Nevertheless, the precise nature of the single-photon emission mechanism remains uncertain due to the multitude of potential defects that can form in GaN. In this work, our systematical investigation with the ab initio calculation indicates that carbon and silicon, as common dopants in gallium nitride, can interact with intrinsic defects in GaN and form new high-speed defect single-photon sources. Our findings identify a ternary defect NVC that possesses a short lifetime of less than 1 ns and a small zero-photon line (ZPL) of 864 nm. In other words, this defect can serve as a high-speed single photon source in the short wavelength window for fiber communication. In sharp contrast, the Si-supported defect NVSi has a higher unoccupied defect energy level which enters the conduction band and is therefore unsuitable for single photon emission. A systematic investigation has been conducted into the potential defects, thermal stability, and single-photon emission properties. The relaxation calculation and self-consistent calculations employed the Perdew-Burke-Ernzerhof exchange-correlation functional and Heyd-Scuseria-Ernzerhof exchange-correlation functional, respectively. These findings indicate the potential for high-performance single-photon sources through carbon or silicon doping of GaN.

摘要

近年来,氮化镓(GaN)中的缺陷单光子发射器(SPE)因其具备的优势而备受关注,这些优势包括能够在室温下工作、发射线宽窄以及亮度高。然而,由于氮化镓中可能形成的大量潜在缺陷,单光子发射机制的确切性质仍不确定。在这项工作中,我们通过从头算计算进行的系统研究表明,作为氮化镓中常见的掺杂剂,碳和硅可以与氮化镓中的本征缺陷相互作用,形成新的高速缺陷单光子源。我们的研究结果确定了一种三元缺陷NVC,其寿命短于1 ns,零光子线(ZPL)小,为864 nm。换句话说,这种缺陷可以作为光纤通信短波长窗口中的高速单光子源。与之形成鲜明对比的是,硅支撑的缺陷NVSi具有较高的未占据缺陷能级,该能级进入导带,因此不适合单光子发射。我们对潜在缺陷、热稳定性和单光子发射特性进行了系统研究。弛豫计算和自洽计算分别采用了Perdew-Burke-Ernzerhof交换关联泛函和Heyd-Scuseria-Ernzerhof交换关联泛函。这些发现表明通过对氮化镓进行碳或硅掺杂来制备高性能单光子源具有潜力。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/53cd/11312604/7288b3b4963b/materials-17-03788-g001.jpg

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