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基于氮化铝镓的高效深紫外发光二极管:从带隙工程到器件工艺

Highly efficient AlGaN-based deep-ultraviolet light-emitting diodes: from bandgap engineering to device craft.

作者信息

Liu Xu, Lv Zhenxing, Liao Zhefu, Sun Yuechang, Zhang Ziqi, Sun Ke, Zhou Qianxi, Tang Bin, Geng Hansong, Qi Shengli, Zhou Shengjun

机构信息

Center for Photonics and Semiconductors, School of Power and Mechanical Engineering, Wuhan University, Wuhan, 430072 China.

Ningbo ANN Semiconductor Co. Ltd., Ningbo, 315336 China.

出版信息

Microsyst Nanoeng. 2024 Aug 13;10:110. doi: 10.1038/s41378-024-00737-x. eCollection 2024.

Abstract

AlGaN-based light-emitting diodes (LEDs) operating in the deep-ultraviolet (DUV) spectral range (210-280 nm) have demonstrated potential applications in physical sterilization. However, the poor external quantum efficiency (EQE) hinders further advances in the emission performance of AlGaN-based DUV LEDs. Here, we demonstrate the performance of 270-nm AlGaN-based DUV LEDs beyond the state-of-the-art by exploiting the innovative combination of bandgap engineering and device craft. By adopting tailored multiple quantum wells (MQWs), a reflective Al reflector, a low-optical-loss tunneling junction (TJ) and a dielectric SiO insertion structure (IS-SiO), outstanding light output powers (LOPs) of 140.1 mW are achieved in our DUV LEDs at 850 mA. The EQEs of our DUV LEDs are 4.5 times greater than those of their conventional counterparts. This comprehensive approach overcomes the major difficulties commonly faced in the pursuit of high-performance AlGaN-based DUV LEDs, such as strong quantum-confined Stark effect (QCSE), severe optical absorption in the p-electrode/ohmic contact layer and poor transverse magnetic (TM)-polarized light extraction. Furthermore, the on-wafer electroluminescence characterization validated the scalability of our DUV LEDs to larger production scales. Our work is promising for the development of highly efficient AlGaN-based DUV LEDs.

摘要

工作在深紫外(DUV)光谱范围(210 - 280纳米)的基于氮化铝镓(AlGaN)的发光二极管(LED)已在物理杀菌方面展现出潜在应用。然而,较差的外量子效率(EQE)阻碍了基于AlGaN的深紫外LED发光性能的进一步提升。在此,我们通过利用带隙工程与器件工艺的创新组合,展示了性能超越现有技术水平的270纳米基于AlGaN的深紫外LED。通过采用定制的多量子阱(MQW)、反射性Al反射器、低光损耗隧道结(TJ)以及介电SiO插入结构(IS - SiO),我们的深紫外LED在850毫安电流下实现了140.1毫瓦的出色光输出功率(LOP)。我们深紫外LED的EQE比传统同类产品高4.5倍。这种综合方法克服了在追求高性能基于AlGaN的深紫外LED过程中通常面临的主要困难,如强量子限制斯塔克效应(QCSE)、p电极/欧姆接触层中的严重光吸收以及横向磁(TM)偏振光提取不佳等问题。此外,晶圆上的电致发光表征验证了我们深紫外LED扩大到更大生产规模的可扩展性。我们的工作对于高效基于AlGaN的深紫外LED的发展具有重要意义。

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