• 文献检索
  • 文档翻译
  • 深度研究
  • 学术资讯
  • Suppr Zotero 插件Zotero 插件
  • 邀请有礼
  • 套餐&价格
  • 历史记录
应用&插件
Suppr Zotero 插件Zotero 插件浏览器插件Mac 客户端Windows 客户端微信小程序
定价
高级版会员购买积分包购买API积分包
服务
文献检索文档翻译深度研究API 文档MCP 服务
关于我们
关于 Suppr公司介绍联系我们用户协议隐私条款
关注我们

Suppr 超能文献

核心技术专利:CN118964589B侵权必究
粤ICP备2023148730 号-1Suppr @ 2026

文献检索

告别复杂PubMed语法,用中文像聊天一样搜索,搜遍4000万医学文献。AI智能推荐,让科研检索更轻松。

立即免费搜索

文件翻译

保留排版,准确专业,支持PDF/Word/PPT等文件格式,支持 12+语言互译。

免费翻译文档

深度研究

AI帮你快速写综述,25分钟生成高质量综述,智能提取关键信息,辅助科研写作。

立即免费体验

通过ABO型Ruddlesden-Popper结构中类似插层的阳离子扩散生长的CaRuO薄膜中室温下可能的电流诱导转变

Room-Temperature Possible Current-Induced Transition in CaRuO Thin Films Grown Through Intercalation-Like Cation Diffusion in the ABO Ruddlesden-Popper Structure.

作者信息

Fukuchi Atsushi, Katase Takayoshi, Kamiya Toshio

机构信息

Faculty of Information Science and Technology, Hokkaido University, Sapporo, 060-0814, Japan.

MDX Research Center for Element Strategy, International Research Frontiers Initiative, Tokyo Institute of Technology, Yokohama, 226-8501, Japan.

出版信息

Small Methods. 2024 Dec;8(12):e2400264. doi: 10.1002/smtd.202400264. Epub 2024 Sep 9.

DOI:10.1002/smtd.202400264
PMID:39248649
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC11672186/
Abstract

Cation deficiency tuning is a central issue in thin-film epitaxy of functional metal oxides, as it is typically more difficult than anion deficiency tuning, as anions can be readily supplied from gas sources. Here, highly effective internal deficiency compensation of Ru cations is demonstrated for CaRuO epitaxial films based on diffusive transfer of metal cations in the ABO Ruddlesden-Popper lattice from solid-phase cation sources. Through detailed structural characterization of CaRuO/LaAlO (001) thin films grown with external cation sources by solid-phase epitaxy, the occurrence of intercalation-like, interstitial diffusion of La cations (from the substrates) in the ABO structure is revealed, and that of Ru cations is also suggested. Relying on the interstitial-type diffusion, an optimized Ru deficiency compensation method, which does not induce the formation of Ca RuO Ruddlesden-Popper impurity phases with higher n, is proposed for CaRuO epitaxial films. In the CaRuO/LaAlO (001) thin films grown with Ru deficiency compensation, record-high resistivity values (10-10 Ω cm) and a large (more than 200 K) increase in the temperature range of the nonlinear transport properties are demonstrated by transport measurements, demonstrating the possible advantages of this method in the control of the current-induced quantum phase transition of CaRuO.

摘要

阳离子缺陷调控是功能金属氧化物薄膜外延生长中的一个核心问题,因为它通常比阴离子缺陷调控更困难,这是由于阴离子可以很容易地从气体源中提供。在此,基于ABO型Ruddlesden-Popper晶格中金属阳离子从固相阳离子源的扩散转移,展示了CaRuO外延薄膜中Ru阳离子的高效内部缺陷补偿。通过对通过固相外延生长的带有外部阳离子源的CaRuO/LaAlO(001)薄膜进行详细的结构表征,揭示了La阳离子(来自衬底)在ABO结构中类似插层的间隙扩散的发生情况,同时也表明了Ru阳离子的间隙扩散。基于间隙型扩散,针对CaRuO外延薄膜提出了一种优化的Ru缺陷补偿方法,该方法不会诱导形成具有更高n值的CaRuO Ruddlesden-Popper杂质相。在通过Ru缺陷补偿生长的CaRuO/LaAlO(001)薄膜中,通过输运测量证明了创纪录的高电阻率值(10-10Ω·cm)以及非线性输运特性温度范围内大幅(超过200K)的增加,这证明了该方法在控制CaRuO电流诱导量子相变方面可能具有的优势。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/afff/11672186/e75841f75896/SMTD-8-2400264-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/afff/11672186/c9ebbb422173/SMTD-8-2400264-g008.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/afff/11672186/88184589e94c/SMTD-8-2400264-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/afff/11672186/622ace635d4a/SMTD-8-2400264-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/afff/11672186/70707f4a0c7d/SMTD-8-2400264-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/afff/11672186/f38d1f8be8a0/SMTD-8-2400264-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/afff/11672186/a0c1a98ca4fa/SMTD-8-2400264-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/afff/11672186/e75841f75896/SMTD-8-2400264-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/afff/11672186/c9ebbb422173/SMTD-8-2400264-g008.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/afff/11672186/88184589e94c/SMTD-8-2400264-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/afff/11672186/622ace635d4a/SMTD-8-2400264-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/afff/11672186/70707f4a0c7d/SMTD-8-2400264-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/afff/11672186/f38d1f8be8a0/SMTD-8-2400264-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/afff/11672186/a0c1a98ca4fa/SMTD-8-2400264-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/afff/11672186/e75841f75896/SMTD-8-2400264-g006.jpg

相似文献

1
Room-Temperature Possible Current-Induced Transition in CaRuO Thin Films Grown Through Intercalation-Like Cation Diffusion in the ABO Ruddlesden-Popper Structure.通过ABO型Ruddlesden-Popper结构中类似插层的阳离子扩散生长的CaRuO薄膜中室温下可能的电流诱导转变
Small Methods. 2024 Dec;8(12):e2400264. doi: 10.1002/smtd.202400264. Epub 2024 Sep 9.
2
Stable and Tunable Current-Induced Phase Transition in Epitaxial Thin Films of CaRuO.CaRuO外延薄膜中稳定且可调谐的电流诱导相变
ACS Appl Mater Interfaces. 2020 Jun 24;12(25):28368-28374. doi: 10.1021/acsami.0c05181. Epub 2020 Jun 9.
3
Spectroscopic Evidence of a Dimensionality-Induced Metal-to-Insulator Transition in the Ruddlesden-Popper LaNiO Series.鲁德尔斯登-波珀LaNiO系列中维度诱导的金属-绝缘体转变的光谱证据。
ACS Appl Mater Interfaces. 2021 Feb 10;13(5):6813-6819. doi: 10.1021/acsami.0c19577. Epub 2021 Jan 26.
4
Mott Insulator CaRuO under External Electric Field.外电场作用下的莫特绝缘体CaRuO
Materials (Basel). 2022 Sep 26;15(19):6657. doi: 10.3390/ma15196657.
5
Formation of Ruddlesden-Popper Faults and Their Effect on the Magnetic Properties in PrSrCoO Thin Films.Ruddlesden-Popper 位错的形成及其对 PrSrCoO 薄膜磁性能的影响。
ACS Appl Mater Interfaces. 2018 Jan 10;10(1):1428-1433. doi: 10.1021/acsami.7b16341. Epub 2017 Dec 28.
6
Applying Configurational Complexity to the 2D Ruddlesden-Popper Crystal Structure.将构型复杂性应用于二维鲁德尔斯登-波珀晶体结构。
ACS Nano. 2020 Oct 27;14(10):13030-13037. doi: 10.1021/acsnano.0c04487. Epub 2020 Sep 23.
7
Superconducting SrRuO Thin Films without Out-of-Phase Boundaries by Higher-Order Ruddlesden-Popper Intergrowth.通过高阶Ruddlesden-Popper共生生长制备无反相边界的超导SrRuO薄膜
Nano Lett. 2021 May 26;21(10):4185-4192. doi: 10.1021/acs.nanolett.0c04963. Epub 2021 May 12.
8
Atomic mapping of Ruddlesden-Popper faults in transparent conducting BaSnO3-based thin films.透明导电的基于BaSnO₃的薄膜中Ruddlesden-Popper缺陷的原子映射。
Sci Rep. 2015 Nov 3;5:16097. doi: 10.1038/srep16097.
9
Spontaneous phase segregation of SrNiO and SrNiO during SrNiO heteroepitaxy.在SrNiO异质外延过程中SrNiO的自发相分离。 (你提供的原文中两次提到SrNiO ,可能有误,正常应该是不同物质,比如 SrNiO₂之类的与SrNiO进行对比等情况,这里按原文准确翻译)
Sci Adv. 2021 Mar 5;7(10). doi: 10.1126/sciadv.abe2866. Print 2021 Mar.
10
Defect Engineering in A BO Thin Films via Surface-Reconstructed LaSrAlO Substrates.
Small Methods. 2022 Nov;6(11):e2200880. doi: 10.1002/smtd.202200880. Epub 2022 Oct 17.

本文引用的文献

1
Nanoelectronics Using Metal-Insulator Transition.利用金属-绝缘体转变的纳米电子学
Adv Mater. 2024 Feb;36(5):e2305353. doi: 10.1002/adma.202305353. Epub 2023 Nov 30.
2
Real-space imaging of periodic nanotextures in thin films via phasing of diffraction data.通过相位衬度衍射数据实现薄膜中周期性纳米结构的实空间成像。
Proc Natl Acad Sci U S A. 2023 Jul 11;120(28):e2303312120. doi: 10.1073/pnas.2303312120. Epub 2023 Jul 6.
3
Pattern Formation by Electric-Field Quench in a Mott Crystal.莫特晶体中电场猝灭导致的图案形成
Nano Lett. 2023 Sep 13;23(17):7782-7789. doi: 10.1021/acs.nanolett.3c00574. Epub 2023 May 18.
4
Defect Engineering in A BO Thin Films via Surface-Reconstructed LaSrAlO Substrates.
Small Methods. 2022 Nov;6(11):e2200880. doi: 10.1002/smtd.202200880. Epub 2022 Oct 17.
5
Superconducting SrRuO Thin Films without Out-of-Phase Boundaries by Higher-Order Ruddlesden-Popper Intergrowth.通过高阶Ruddlesden-Popper共生生长制备无反相边界的超导SrRuO薄膜
Nano Lett. 2021 May 26;21(10):4185-4192. doi: 10.1021/acs.nanolett.0c04963. Epub 2021 May 12.
6
Stable and Tunable Current-Induced Phase Transition in Epitaxial Thin Films of CaRuO.CaRuO外延薄膜中稳定且可调谐的电流诱导相变
ACS Appl Mater Interfaces. 2020 Jun 24;12(25):28368-28374. doi: 10.1021/acsami.0c05181. Epub 2020 Jun 9.
7
Unique Crystal Structure of Ca_{2}RuO_{4} in the Current Stabilized Semimetallic State.Ca_{2}RuO_{4}在电流稳定的半金属态中的独特晶体结构。
Phys Rev Lett. 2019 Sep 27;123(13):137204. doi: 10.1103/PhysRevLett.123.137204.
8
Atomically precise interfaces from non-stoichiometric deposition.非化学计量沉积的原子级精确界面。
Nat Commun. 2014 Aug 4;5:4530. doi: 10.1038/ncomms5530.
9
Exploiting dimensionality and defect mitigation to create tunable microwave dielectrics.利用维度和缺陷缓解来创造可调谐微波介电材料。
Nature. 2013 Oct 24;502(7472):532-6. doi: 10.1038/nature12582. Epub 2013 Oct 16.
10
Electric-field-induced metal maintained by current of the Mott insulator Ca2RuO4.由莫特绝缘体Ca2RuO4的电流维持的电场诱导金属。
Sci Rep. 2013;3:2536. doi: 10.1038/srep02536.