Fukuchi Atsushi, Katase Takayoshi, Kamiya Toshio
Faculty of Information Science and Technology, Hokkaido University, Sapporo, 060-0814, Japan.
MDX Research Center for Element Strategy, International Research Frontiers Initiative, Tokyo Institute of Technology, Yokohama, 226-8501, Japan.
Small Methods. 2024 Dec;8(12):e2400264. doi: 10.1002/smtd.202400264. Epub 2024 Sep 9.
Cation deficiency tuning is a central issue in thin-film epitaxy of functional metal oxides, as it is typically more difficult than anion deficiency tuning, as anions can be readily supplied from gas sources. Here, highly effective internal deficiency compensation of Ru cations is demonstrated for CaRuO epitaxial films based on diffusive transfer of metal cations in the ABO Ruddlesden-Popper lattice from solid-phase cation sources. Through detailed structural characterization of CaRuO/LaAlO (001) thin films grown with external cation sources by solid-phase epitaxy, the occurrence of intercalation-like, interstitial diffusion of La cations (from the substrates) in the ABO structure is revealed, and that of Ru cations is also suggested. Relying on the interstitial-type diffusion, an optimized Ru deficiency compensation method, which does not induce the formation of Ca RuO Ruddlesden-Popper impurity phases with higher n, is proposed for CaRuO epitaxial films. In the CaRuO/LaAlO (001) thin films grown with Ru deficiency compensation, record-high resistivity values (10-10 Ω cm) and a large (more than 200 K) increase in the temperature range of the nonlinear transport properties are demonstrated by transport measurements, demonstrating the possible advantages of this method in the control of the current-induced quantum phase transition of CaRuO.
阳离子缺陷调控是功能金属氧化物薄膜外延生长中的一个核心问题,因为它通常比阴离子缺陷调控更困难,这是由于阴离子可以很容易地从气体源中提供。在此,基于ABO型Ruddlesden-Popper晶格中金属阳离子从固相阳离子源的扩散转移,展示了CaRuO外延薄膜中Ru阳离子的高效内部缺陷补偿。通过对通过固相外延生长的带有外部阳离子源的CaRuO/LaAlO(001)薄膜进行详细的结构表征,揭示了La阳离子(来自衬底)在ABO结构中类似插层的间隙扩散的发生情况,同时也表明了Ru阳离子的间隙扩散。基于间隙型扩散,针对CaRuO外延薄膜提出了一种优化的Ru缺陷补偿方法,该方法不会诱导形成具有更高n值的CaRuO Ruddlesden-Popper杂质相。在通过Ru缺陷补偿生长的CaRuO/LaAlO(001)薄膜中,通过输运测量证明了创纪录的高电阻率值(10-10Ω·cm)以及非线性输运特性温度范围内大幅(超过200K)的增加,这证明了该方法在控制CaRuO电流诱导量子相变方面可能具有的优势。