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A/A图谱的比例鉴定出水稻中包含已知光保护恢复相关基因的染色体区域。

The Ratio of A/A Mapping Identifies Chromosomal Regions Containing Known Photoprotection Recovery-Related Genes in Rice.

作者信息

Saha Shoumik, Mahapatra Nilanjan Sinha, Bhattacharya Kriti, Kundu Rimpa, Nimitha K, Ganguly Shamba, Ganguly Sebantee, Biswas Tirthankar, Bhattacharyya Prabir K, Bhattacharyya Somnath

机构信息

Crop Research Unit, Genetics and Plant Breeding, Bidhan Chandra Krishi Viswavidyalaya, Mohanpur, 741252, India.

出版信息

Rice (N Y). 2024 Sep 16;17(1):62. doi: 10.1186/s12284-024-00739-3.

Abstract

The rice, like other plants, undergoes photoprotection mode by increasing nonphotochemical quenching (NPQ) in high light intensity (> 1200 µmol ms PPFD), which attenuates photosystem II yield (φPSII) drastically. The plant remains in photoprotection mode even after light intensity becomes not stressful for an extended period. While there are significant differences in the time it takes for photoprotection to recover among different genotypes, its use is limited in plant breeding because measuring the chlorophyll fluorescence parameters in progressive actinic light after dark adaptation takes more than forty-five minutes per genotype. The study finds that instantly measured A/A ratio by five minutes in flag leaves of 25 diverse genotypes strongly associated with the φPSII differences between theoretical and actual, qPd and NPQ with R values 0.74, 0.65 and 0.60, respectively. In two consecutive years, GWAS of A/A ratio identified the regions with genes reported earlier for plant photoprotection recovery. Additionally, QTL analysis in a RIL population also identified the regions carrying known genes related to photoprotection. Thus, the A/A ratio can quickly phenotype many plants for easier introgression of the traits in popular cultivars. The identified genotypes, genes, and QTLs can be used to improve yield potential and allele mining.

摘要

水稻与其他植物一样,在高光强(>1200 μmol m⁻² s⁻¹光合光子通量密度)下通过增加非光化学猝灭(NPQ)进入光保护模式,这会大幅降低光系统II的量子产额(φPSII)。即使在光强长时间不再构成胁迫之后,植株仍处于光保护模式。虽然不同基因型恢复光保护所需的时间存在显著差异,但由于在暗适应后对不同基因型逐次增加光化光强度来测量叶绿素荧光参数,每个基因型需要花费超过45分钟,因此其在植物育种中的应用受到限制。该研究发现,在25个不同基因型的旗叶中5分钟内即时测得的A/A比值与理论值和实际值之间的φPSII差异、光化学猝灭系数(qPd)和NPQ显著相关,相关系数R分别为0.74、0.65和0.60。连续两年,对A/A比值进行全基因组关联研究(GWAS)确定了先前报道的与植物光保护恢复相关基因所在的区域。此外,在一个重组自交系群体中进行的数量性状位点(QTL)分析也确定了携带与光保护相关已知基因的区域。因此,A/A比值可以快速对许多植株进行表型分析,以便更轻松地将这些性状导入流行品种。所鉴定的基因型、基因和QTL可用于提高产量潜力和等位基因挖掘。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/5bbf/11405727/2b2221d1ea19/12284_2024_739_Fig1_HTML.jpg

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