Saitoh Koh, Oyobe Teppei, Igarashi Keisuke, Sato Takeshi, Matsumoto Hiroaki, Inada Hiromi, Endo Takahiko, Miyata Yasumitsu, Usami Rei, Takenobu Taishi
Institute of Materials and Systems for Sustainability, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan.
Department of Applied Physics, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan.
Microscopy (Oxf). 2025 Jan 30;74(1):28-34. doi: 10.1093/jmicro/dfae041.
The surface sensitivity of high-resolution secondary electron (SE) imaging is examined using twisted bilayers of MoS2 stacked at an angle of 30°. High-resolution SE images of the twisted bilayer MoS2 show a honeycomb structure composed of Mo and S atoms, elucidating the monolayer structure of MoS2. Simultaneously captured annular dark-field scanning transmission electron microscope images from the same region show the projected structure of the two layers. That is, the SE images from the bilayer MoS2 selectively visualize the surface monolayer. It is noted that the SE yields from the surface monolayer are approximately three times higher than those from the second monolayer, likely attributable to attenuation when SEs emitted from the second layer traverse the surface layer. The surface sensitivity of high-resolution SE imaging is examined using twisted bilayers of MoS2 stacked at an angle of 30°. It was found that the SE images of the MoS2 bilayer visualize the surface monolayer approximately three times more intensely than the second monolayer.
使用以30°角堆叠的扭曲双层二硫化钼(MoS2)来研究高分辨率二次电子(SE)成像的表面灵敏度。扭曲双层MoS2的高分辨率SE图像显示出由Mo和S原子组成的蜂窝结构,阐明了MoS2的单层结构。从同一区域同时捕获的环形暗场扫描透射电子显微镜图像显示了两层的投影结构。也就是说,双层MoS2的SE图像选择性地显示了表面单层。值得注意的是,表面单层的SE产额大约是第二层的三倍,这可能是由于从第二层发射的二次电子穿过表面层时发生了衰减。使用以30°角堆叠的扭曲双层MoS2来研究高分辨率SE成像的表面灵敏度。发现MoS2双层的SE图像显示表面单层的强度比第二层大约高三倍。