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用于增强突触特性的氧等离子体处理的Al/TaO/Al电阻式存储器。

Oxygen-Plasma-Treated Al/TaO/Al Resistive Memory for Enhanced Synaptic Characteristics.

作者信息

Kim Gyeongpyo, Park Seoyoung, Koo Minsuk, Kim Sungjun

机构信息

Division of Electronics and Electrical Engineering, Dongguk University, Seoul 04620, Republic of Korea.

Department of AI Semiconductor, School of Advanced Cross-Disciplinary Studies, University of Seoul, Seoul 02504, Republic of Korea.

出版信息

Biomimetics (Basel). 2024 Sep 23;9(9):578. doi: 10.3390/biomimetics9090578.

DOI:10.3390/biomimetics9090578
PMID:39329600
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC11430571/
Abstract

In this study, we investigate the impact of O plasma treatment on the performance of Al/TaO/Al-based resistive random-access memory (RRAM) devices, focusing on applications in neuromorphic systems. Comparative analysis using scanning electron microscopy and X-ray photoelectron spectroscopy confirmed the differences in chemical composition between O-plasma-treated and untreated RRAM cells. Direct-current measurements showed that O-plasma-treated RRAM cells exhibited significant improvements over untreated RRAM cells, including higher on/off ratios, improved uniformity and distribution, longer retention times, and enhanced durability. The conduction mechanism is investigated by current-voltage (I-V) curve fitting. In addition, paired-pulse facilitation (PPF) is observed using partial short-term memory. Furthermore, 3- and 4-bit weight tuning with auto-pulse-tuning algorithms was achieved to improve the controllability of the synapse weight for the neuromorphic system, maintaining retention times exceeding 10 s in the multiple states. Neuromorphic simulation with an MNIST dataset is conducted to evaluate the synaptic device.

摘要

在本研究中,我们研究了氧等离子体处理对基于Al/TaO/Al的电阻式随机存取存储器(RRAM)器件性能的影响,重点关注其在神经形态系统中的应用。使用扫描电子显微镜和X射线光电子能谱进行的对比分析证实了经氧等离子体处理和未经处理的RRAM单元在化学成分上的差异。直流测量表明,经氧等离子体处理的RRAM单元相较于未经处理的RRAM单元有显著改善,包括更高的开/关比、更好的均匀性和分布、更长的保持时间以及更高的耐久性。通过电流-电压(I-V)曲线拟合研究了传导机制。此外,利用部分短期记忆观察到了双脉冲易化(PPF)。此外,通过自动脉冲调谐算法实现了3位和4位权重调谐,以提高神经形态系统中突触权重的可控性,在多种状态下保持时间超过10秒。使用MNIST数据集进行神经形态模拟以评估突触器件。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8d6f/11430571/ad63ae126b9f/biomimetics-09-00578-g007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8d6f/11430571/75f4832aa604/biomimetics-09-00578-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8d6f/11430571/1c73df2299a3/biomimetics-09-00578-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8d6f/11430571/b8260ef114b4/biomimetics-09-00578-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8d6f/11430571/7aa64c88dc6f/biomimetics-09-00578-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8d6f/11430571/51256750ea78/biomimetics-09-00578-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8d6f/11430571/2c93f7dda24e/biomimetics-09-00578-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8d6f/11430571/ad63ae126b9f/biomimetics-09-00578-g007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8d6f/11430571/75f4832aa604/biomimetics-09-00578-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8d6f/11430571/1c73df2299a3/biomimetics-09-00578-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8d6f/11430571/b8260ef114b4/biomimetics-09-00578-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8d6f/11430571/7aa64c88dc6f/biomimetics-09-00578-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8d6f/11430571/51256750ea78/biomimetics-09-00578-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8d6f/11430571/2c93f7dda24e/biomimetics-09-00578-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8d6f/11430571/ad63ae126b9f/biomimetics-09-00578-g007.jpg

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本文引用的文献

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Realization of Multiple Synapse Plasticity by Coexistence of Volatile and Nonvolatile Characteristics of Interface Type Memristor.通过界面型忆阻器的挥发性和非挥发性特性共存实现多重突触可塑性。
ACS Appl Mater Interfaces. 2024 May 15;16(19):24929-24942. doi: 10.1021/acsami.4c03148. Epub 2024 Apr 30.
2
Implementation of Artificial Synapse Using IGZO-Based Resistive Switching Device.基于铟镓锌氧化物(IGZO)电阻式开关器件的人工突触实现
Materials (Basel). 2024 Jan 19;17(2):481. doi: 10.3390/ma17020481.
3
Transformed Filaments by Oxygen Plasma Treatment and Improved Resistance State.
经氧等离子体处理的转变细丝及改善的电阻状态
Nanomaterials (Basel). 2022 Aug 7;12(15):2716. doi: 10.3390/nano12152716.
4
A New Approach to the Fabrication of Memristive Neuromorphic Devices: Compositionally Graded Films.一种制造忆阻神经形态器件的新方法:成分渐变薄膜。
Materials (Basel). 2020 Aug 20;13(17):3680. doi: 10.3390/ma13173680.
5
Resistive Random Access Memory (RRAM): an Overview of Materials, Switching Mechanism, Performance, Multilevel Cell (mlc) Storage, Modeling, and Applications.电阻式随机存取存储器(RRAM):材料、开关机制、性能、多级单元(MLC)存储、建模及应用综述
Nanoscale Res Lett. 2020 Apr 22;15(1):90. doi: 10.1186/s11671-020-03299-9.
6
On the role of the metal oxide/reactive electrode interface during the forming procedure of valence change ReRAM devices.在变价 ReRAM 器件形成过程中,金属氧化物/反应电极界面的作用。
Nanoscale. 2019 Oct 10;11(39):18201-18208. doi: 10.1039/c9nr06624a.
7
Direct Observation of Structural Deformation Immunity for Understanding Oxygen Plasma Treatment-Enhanced Resistive Switching in HfO-Based Memristive Devices.通过直接观察结构变形免疫来理解氧等离子体处理增强基于HfO的忆阻器件中的电阻开关特性
Nanomaterials (Basel). 2019 Sep 21;9(10):1355. doi: 10.3390/nano9101355.
8
Bipolar Analog Memristors as Artificial Synapses for Neuromorphic Computing.作为用于神经形态计算的人工突触的双极模拟忆阻器
Materials (Basel). 2018 Oct 26;11(11):2102. doi: 10.3390/ma11112102.
9
Forming-free performance of a-SiN :H-based resistive switching memory obtained by oxygen plasma treatment.通过氧等离子体处理获得的非晶硅氮化物:氢基电阻式开关存储器的免形成性能。
Nanotechnology. 2018 Jun 15;29(24):245701. doi: 10.1088/1361-6528/aab9e1. Epub 2018 Mar 27.
10
Memristive Ion Channel-Doped Biomembranes as Synaptic Mimics.作为突触模拟物的忆阻离子通道掺杂生物膜
ACS Nano. 2018 May 22;12(5):4702-4711. doi: 10.1021/acsnano.8b01282. Epub 2018 Mar 29.