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氧化镍薄膜的三阶非线性光学开关和阈值限制

Third-order non-linear optical switching and threshold limiting of NiO thin films.

作者信息

Bhakta Sourav, Panda Rudrashish, Sahoo Pratap Kumar

机构信息

School of Physical Sciences, National Institute of Science Education and Research Bhubaneswar, An OCC of Homi Bhabha National Institute, Jatni, 752050, Odisha, India.

Center for Interdisciplinary Sciences (CIS), NISER Bhubaneswar, HBNI, Jatni, 752050, Odisha, India.

出版信息

Sci Rep. 2024 Oct 1;14(1):22767. doi: 10.1038/s41598-024-69853-y.

Abstract

This study discusses the nonlinear optical properties of as-grown and annealed NiO thin films using the Z-scan technique utilizing the femtosecond laser pulses at a repetition rate of 100 kHz of wavelength 1030 nm with a pulse duration of 370 fs. In open aperture measurements, pristine reveal saturable absorption (SA) with a negative sign of nonlinearity, while annealed samples exhibit reverse saturable absorption (RSA) with a positive sign of nonlinearity. In closed aperture conditions, all samples show prefocal minima and postfocal maxima, indicating self-focusing behavior. The observed RSA phenomena are attributed to the indirect two-photon absorption (TPA) process. The influence of surface plasmon resonance on nonlinear absorption is successfully ruled out due to insufficient excitation energy (1.20 eV) to induce resonance in the samples. The increase in bandgap with annealing temperature, associated with indirect TPA, is elucidated with the shifting of Ni- and Ni- orbitals in the conduction band, under the framework of Density Functional Theory (DFT). The DFT results are correlated with the observed nonlinear SA and RSA processes. The Ni d-d and Ni-d to O-p transitions contribute to the modulation of nonlinearity in the indirect TPA process. The study suggests that the sample annealed at 400 °C exhibits superior optical limiting properties with the highest nonlinear absorption coefficients compared to the other annealed sample, while the as-grown sample is suitable for passive Q-switching applications.

摘要

本研究使用Z扫描技术,利用波长为1030 nm、重复频率为100 kHz、脉冲持续时间为370 fs的飞秒激光脉冲,讨论了生长态和退火态NiO薄膜的非线性光学性质。在开孔测量中,原始样品呈现出具有负非线性符号的饱和吸收(SA),而退火样品则表现出具有正非线性符号的反饱和吸收(RSA)。在闭孔条件下,所有样品均显示焦前最小值和焦后最大值,表明存在自聚焦行为。观察到的RSA现象归因于间接双光子吸收(TPA)过程。由于激发能量(1.20 eV)不足以在样品中诱导共振,成功排除了表面等离子体共振对非线性吸收的影响。在密度泛函理论(DFT)框架下,通过导带中Ni-和Ni-轨道的移动,阐明了带隙随退火温度的增加与间接TPA的关系。DFT结果与观察到的非线性SA和RSA过程相关。Ni d-d和Ni-d到O-p跃迁有助于间接TPA过程中非线性的调制。研究表明,与其他退火样品相比,在400°C退火的样品表现出优异的光学限幅性能,具有最高的非线性吸收系数,而生长态样品适用于被动调Q应用。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/89b7/11445430/ebdc601b173d/41598_2024_69853_Fig1_HTML.jpg

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