Gandhi Ashish Chhaganlal, Wu Sheng Yun
Department of Physics, National Dong Hwa University, Hualien 97401, Taiwan.
Center for Condensed Matter Sciences, National Taiwan University, Taipei 10617, Taiwan.
Nanomaterials (Basel). 2017 Aug 22;7(8):231. doi: 10.3390/nano7080231.
Nickel oxide is one of the highly promising semiconducting materials, but its large band gap (3.7 to 4 eV) limits its use in practical applications. Here we report the effect of nickel/oxygen vacancies and interstitial defects on the near-band-edge (NBE) and deep-level-emission (DLE) in various sizes of nickel oxide (NiO) nanoparticles. The ultraviolet (UV) emission originated from excitonic recombination corresponding near-band-edge (NBE) transition of NiO, while deep-level-emission (DLE) in the visible region due to various structural defects such as oxygen vacancies and interstitial defects. We found that the NiO nanoparticles exhibit a strong green band emission around ~2.37 eV in all samples, covering 80% integrated intensity of PL spectra. This apparently anomalous phenomenon is attributed to photogenerated holes trapped in the deep level oxygen vacancy recombining with the electrons trapped in a shallow level located just below the conducting band.
氧化镍是极具前景的半导体材料之一,但其较大的带隙(3.7至4电子伏特)限制了其在实际应用中的使用。在此,我们报告了镍/氧空位和间隙缺陷对各种尺寸的氧化镍(NiO)纳米颗粒的近带边(NBE)和深能级发射(DLE)的影响。紫外(UV)发射源于与NiO近带边(NBE)跃迁相对应的激子复合,而可见光区域的深能级发射(DLE)则归因于各种结构缺陷,如氧空位和间隙缺陷。我们发现,在所有样品中,NiO纳米颗粒在约2.37电子伏特处均表现出强烈的绿色带发射,占PL光谱积分强度的80%。这种明显异常的现象归因于捕获在深能级氧空位中的光生空穴与捕获在导带下方浅能级中的电子复合。