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六方氮化硼中色心的窄带电致发光

Narrowband Electroluminescence from Color Centers in Hexagonal Boron Nitride.

作者信息

Park Gyuna, Zhigulin Ivan, Jung Hoyoung, Horder Jake, Yamamura Karin, Han Yerin, Cho Hyunje, Jeong Hyeon-Woo, Watanabe Kenji, Taniguchi Takashi, Oh Myungchul, Lee Gil-Ho, Jo Moon-Ho, Aharonovich Igor, Kim Jonghwan

机构信息

Center for Van der Waals Quantum Solids, Institute for Basic Science (IBS), Pohang 37673, Republic of Korea.

Department of Materials Science and Engineering, Pohang University of Science and Technology, Pohang 37673, Republic of Korea.

出版信息

Nano Lett. 2024 Dec 4;24(48):15268-15274. doi: 10.1021/acs.nanolett.4c03824. Epub 2024 Oct 21.

Abstract

Defects in wide bandgap materials have emerged as promising candidates for solid-state quantum optical technologies. Electrical excitation of single emitters may lead to scalable on-chip devices and therefore is highly sought after. However, most wide bandgap materials are not amenable to efficient doping, posing challenges for electrical excitation and on-chip integration. Here, we demonstrate narrowband electroluminescence from visible and near-infrared color centers in hexagonal boron nitride (hBN). We harness van der Waals tunnel junctions of graphene-hBN-graphene. Charge carriers are electrically injected into hBN, exciting localized defects that emit nonclassical light, as characterized by the second order correlation measurement. Remarkably, the devices operate at room temperature and produce robust, narrowband emission spanning from visible to the near-infrared. Our work marks an important milestone in vdW materials and their promising attributes for integrated quantum technologies and on-chip photonic circuits.

摘要

宽带隙材料中的缺陷已成为固态量子光学技术的有前途的候选者。单发射体的电激发可能会导致可扩展的片上器件,因此备受追捧。然而,大多数宽带隙材料不易进行有效掺杂,这给电激发和片上集成带来了挑战。在这里,我们展示了六方氮化硼(hBN)中可见光和近红外色心的窄带电致发光。我们利用了石墨烯-hBN-石墨烯的范德华隧道结。电荷载流子被电注入到hBN中,激发发射非经典光的局域缺陷,这通过二阶关联测量得以表征。值得注意的是,这些器件在室温下运行,并产生从可见光到近红外的强大窄带发射。我们的工作标志着范德华材料及其在集成量子技术和片上光子电路方面的有前途的属性取得了重要里程碑。

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