Tseng Jiun-Yi, Chen Wen-Jauh, Chen Ping-Hang
Graduate School of Materials Science, National Yunlin University of Science and Technology, 123 University Road, Section 3, Yunlin, Douliu 64002, Taiwan.
JBAO Technology Ltd., 24 Chunshenhu East Road, Xiangcheng District, Suzhou 215131, China.
Materials (Basel). 2024 Oct 10;17(20):4953. doi: 10.3390/ma17204953.
This research, which involved a comprehensive methodology, including depositing electroplated copper on a copper seed layer and Al-doped ZnO (AZO) thin films on textured silicon substrates using DC magnetron sputtering with varying substrate heating, has yielded significant findings. The study thoroughly investigated the effects of substrate temperature (Ts) on copper adhesion strength and morphology using the peel force test and electron microscopy. The peel force test was conducted at angles of 90°, 135°, and 180°. The average adhesion strength was about 0.2 N/mm for the samples without substrate heating. For the samples with substrate heating at 100 °C, the average peeling force of the electroplated copper film was about 1 N/mm. The average peeling force increased to 1.5 N/mm as the substrate heating temperature increased to 200 °C. The surface roughness increases as the annealing temperature of the Cu/AZO/Si sample increases. These findings not only provide a reliable and robust method for applying AZO transparent conductive films onto silicon solar cells but also underscore its potential to significantly enhance the efficiency and durability of solar cells significantly, thereby instilling confidence in the field of solar cell technology.
这项研究采用了全面的方法，包括在铜籽晶层上电镀铜，并使用直流磁控溅射在有纹理的硅衬底上沉积铝掺杂氧化锌（AZO）薄膜，且对衬底加热温度进行了变化。该研究通过剥离力测试和电子显微镜全面研究了衬底温度（Ts）对铜附着力强度和形态的影响。剥离力测试在90°、135°和180°的角度下进行。对于未进行衬底加热的样品，平均附着力强度约为0.2N/mm。对于在100°C进行衬底加热的样品，电镀铜膜的平均剥离力约为1N/mm。随着衬底加热温度升至200°C，平均剥离力增加到1.5N/mm。随着Cu/AZO/Si样品退火温度的升高，表面粗糙度增加。这些发现不仅为在硅太阳能电池上应用AZO透明导电膜提供了一种可靠且稳健的方法，还突出了其显著提高太阳能电池效率和耐久性的潜力，从而增强了太阳能电池技术领域的信心。
