Yan Chi, Li Jialin, Wang Haobo, Tong Hua, Ye Xiaojun, Wang Kai, Yuan Xiao, Liu Cui, Li Hongbo
School of Materials Science and Engineering, East China University of Science and Technology Shanghai 200237 China
College of Textiles, Donghua University Shanghai 201620 China.
RSC Adv. 2024 Oct 31;14(47):34833-34842. doi: 10.1039/d4ra06464j. eCollection 2024 Oct 29.
Polyimide (PI) coated with atomic layer deposition (ALD) thin films shows promising potential for applications in extreme environments. To achieve a high quality ultrathin ALD coating on the PI surface, Al-doped ALD-TiO (ATO) films were deposited on the alkaline hydrothermally activated PI surfaces. The nucleation and growth of ATO films were studied by XPS monitoring and SEM observation. The incorporation of aluminum introduced additional active sites that acted as a seed layer, promoting the adsorption and growth of titanium oxide. This effectively compensated for the defects in the TiO film, resulting in the formation of a continuously growing conformal film on the PI surface. After 200 ALD cycles, the ATO film deposited on PI exhibits excellent water vapor barrier properties and significant resistance to atomic oxygen (AO) erosion. When exposed to an AO flux of 1.4 × 10 atom per cm, the erosion yield of the PI coated with 200 ALD cycles of ATO film was as low as 2.4 × 10 cm per atom, which is two orders less than that of the standard polyimide-ref Kapton® film.
涂覆有原子层沉积（ALD）薄膜的聚酰亚胺（PI）在极端环境应用中显示出广阔的前景。为了在PI表面获得高质量的超薄ALD涂层，在碱性水热活化的PI表面沉积了铝掺杂的ALD-TiO（ATO）薄膜。通过XPS监测和SEM观察研究了ATO薄膜的成核和生长。铝的掺入引入了额外的活性位点，作为籽晶层，促进了氧化钛的吸附和生长。这有效地弥补了TiO薄膜中的缺陷，导致在PI表面形成连续生长的保形薄膜。经过200次ALD循环后，沉积在PI上的ATO薄膜表现出优异的水汽阻隔性能和显著的抗原子氧（AO）侵蚀能力。当暴露于每平方厘米1.4×10个原子的AO通量时，涂覆有200次ALD循环ATO薄膜的PI的侵蚀产率低至每原子2.4×10立方厘米，比标准聚酰亚胺薄膜Kapton®低两个数量级。
