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二维四方IV-V族单层材料的计算发现

Computational discovery of two-dimensional tetragonal group IV-V monolayers.

作者信息

Lin Qiubao, Huang Jungang, Fang Yimei, Zheng Feng, Chen Kaixuan, Wu Shunqing, Zhu Zi-Zhong

机构信息

School of Science, Jimei University Xiamen 361021 China

Xiamen Changelight Co., Ltd 361101 Xiamen China.

出版信息

RSC Adv. 2024 Nov 12;14(49):36173-36180. doi: 10.1039/d4ra06623e. eCollection 2024 Nov 11.

Abstract

The two-dimensional (2D) hexagonal group IV-V family has attracted significant attention due to their unique properties and potential applications in electronics, spintronics, and photocatalysis. In this study, we report the discovery of a stable tetragonal allotrope, termed the Td4 phase, of 2D IV-V monolayers through a structural search utilizing an adaptive genetic algorithm. We investigate the geometric structures, structural stabilities, and band structures of the Td4-phase 2D IV-V monolayers (where IV = Si, Ge, Sn; V = P, As, Sb) based on the first-principles calculations. All the investigated 2D IV-V monolayers are dynamically and thermodynamically stable, and exhibit metallic behavior in their pristine form. Furthermore, we investigate the effects of surface hydrogenation on the electronic structures of these monolayers. Except for the hydrogenated GeSb monolayer, the remaining 2D IV-V monolayers turn into indirect semiconductors, with band gap values ranging from 0.15 to 1.12 eV. This work expands the known structural motifs within the 2D group IV-V family and contributes to the ongoing exploration of low-dimensional materials.

摘要

二维(2D)IV-V族六角结构因其独特性质以及在电子学、自旋电子学和光催化领域的潜在应用而备受关注。在本研究中,我们通过使用自适应遗传算法进行结构搜索,报告了二维IV-V单层的一种稳定四方同素异形体(称为Td4相)的发现。基于第一性原理计算,我们研究了Td4相二维IV-V单层(其中IV = Si、Ge、Sn;V = P、As、Sb)的几何结构、结构稳定性和能带结构。所有研究的二维IV-V单层在动力学和热力学上都是稳定的,并且在其原始形式下表现出金属行为。此外,我们研究了表面氢化对这些单层电子结构的影响。除了氢化的GeSb单层外,其余二维IV-V单层转变为间接半导体,带隙值范围为0.15至1.12 eV。这项工作扩展了二维IV-V族中已知的结构基序,并有助于正在进行的低维材料探索。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/a805/11555490/34b60bc48d2f/d4ra06623e-f1.jpg

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