Sakamoto Kenji, Yasuda Takeshi, Minari Takeo, Yoshio Masafumi, Kuwabara Junpei, Takeuchi Masayuki
Research Center for Macromolecules and Biomaterials, National Institute for Materials Science (NIMS), 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan.
Research Center for Macromolecules and Biomaterials, National Institute for Materials Science (NIMS), 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan.
ACS Appl Mater Interfaces. 2024 Dec 11;16(49):68081-68090. doi: 10.1021/acsami.4c15666. Epub 2024 Dec 1.
The bias-stress effects of bottom-gate top-contact polymer-based organic field-effect transistors (OFETs) with different channel lengths (50-500 μm) were evaluated by repeating cycles of prolonged on-state gate-bias application and transfer characteristics measurements in the linear regime. The thicknesses of poly(didodecylquaterthiophene--didodecylbithiazole) active layers were 26 and 37 nm. All OFETs exhibited nonlinear (nonideal) transfer characteristics with a maximum transconductance within the gate-source voltage sweep range. Both a shift in threshold voltage () and a reduction in field-effect charge carrier mobility (μ) were apparently observed during the bias-stress application. When μ and were conventionally extracted from the transfer characteristics around the maximum transconductance, the shift amount and μ reduction depended on the channel length and were smaller in OFETs with short channels. After contact resistance () correction, the channel length dependence disappeared. Thus, the operational stability in OFETs with short channels: ≤50 (150) μm for the 26 (37) nm-thick active layers, was found to be overestimated without correction. This erroneous evaluation would become more pronounced in short-channel, high-mobility OFETs, because the becomes larger relative to the channel resistance with increasing μ and decreasing channel length. These results suggest that one should pay attention to in the fundamental research into the origin of operational instability and in evaluating the effects of active layers, gate dielectrics, and active layer/gate dielectric interfaces on operational stability.
通过在线性区域重复长时间施加导通状态栅极偏置和转移特性测量的循环,评估了具有不同沟道长度(50 - 500μm)的底栅顶接触聚合物基有机场效应晶体管(OFET)的偏置应力效应。聚(二十二烷基四噻吩 - 二十二烷基双噻唑)有源层的厚度分别为26nm和37nm。所有OFET在栅源电压扫描范围内均表现出具有最大跨导的非线性(非理想)转移特性。在施加偏置应力期间,明显观察到阈值电压()的偏移和场效应电荷载流子迁移率(μ)的降低。当从最大跨导附近的转移特性中常规提取μ和时,偏移量和μ降低取决于沟道长度,并且在短沟道OFET中较小。在接触电阻()校正之后,沟道长度依赖性消失。因此,发现对于26(37)nm厚有源层,沟道长度≤50(150)μm的短沟道OFET在未进行校正时其操作稳定性被高估。这种错误评估在短沟道、高迁移率OFET中会变得更加明显,因为随着μ增加和沟道长度减小,相对于沟道电阻会变得更大。这些结果表明,在对操作不稳定性起源的基础研究以及评估有源层、栅极电介质和有源层/栅极电介质界面的操作稳定性影响时,人们应该关注。