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通过单空间调制飞秒脉冲制备的形态可调微透镜阵列

Morphology adjustable microlens array fabricated by single spatially modulated femtosecond pulse.

作者信息

Liu Yang, Li Xiaowei, Wang Zhipeng, Qin Bin, Zhou Shipeng, Huang Ji, Yao Zhulin

机构信息

Laser Micro/Nano Fabrication Laboratory, School of Mechanical Engineering, Beijing Institute of Technology, Beijing 100081, China.

Beijing Institute of Technology Chongqing Innovation Center, Chongqing 401120, PR China.

出版信息

Nanophotonics. 2022 Jan 4;11(3):571-581. doi: 10.1515/nanoph-2021-0629. eCollection 2022 Jan.

Abstract

Silica microlens arrays (MLAs) with multiple numerical-apertures (NAs) have high thermal and mechanical stability, and have potential application prospects in 3D display and rapid detection. However, it is still a challenge to rapidly fabricate silica MLAs with a larger range of NAs and how to obtain multiple NAs in the same aperture diameter. Here, a wet etching assisted spatially modulated femtosecond laser pulse fabricating technology is proposed. In this technology, Gaussian laser pulse is modulated in the axial direction to create a pulse with a large aspect ratio, which is used to modify the silica to obtain a longer modification distance than traditional technology. After that, a microlens with a larger NA can be obtained by etching, and the NA variable range can be up to 0.06-0.65, and even under the same aperture, the variable NA can range up to 0.45-0.65. In addition, a single focus is radially modulated into several focus with different axial lengths to achieve a single exposure fabricating of MLA with multiple NAs. In characterization of the image under a microscope, the multi-plane imaging characteristics of the MLA are revealed. The proposed technology offers great potential toward numerous applications, including microfluidic adaptive imaging and biomedical sensing.

摘要

具有多个数值孔径(NA)的二氧化硅微透镜阵列(MLA)具有高热稳定性和机械稳定性,在3D显示和快速检测方面具有潜在的应用前景。然而,快速制造具有更大NA范围的二氧化硅MLA以及如何在相同孔径直径下获得多个NA仍然是一个挑战。在此,提出了一种湿法蚀刻辅助的空间调制飞秒激光脉冲制造技术。在该技术中,高斯激光脉冲在轴向方向上进行调制,以产生具有大纵横比的脉冲,该脉冲用于对二氧化硅进行改性,从而获得比传统技术更长的改性距离。之后,通过蚀刻可获得具有更大NA的微透镜,NA可变范围可达0.06 - 0.65,甚至在相同孔径下,可变NA范围可达0.45 - 0.65。此外,将单个焦点径向调制为几个具有不同轴向长度的焦点,以实现对具有多个NA的MLA的单次曝光制造。在显微镜下对图像进行表征时,揭示了MLA的多平面成像特性。所提出的技术在众多应用中具有巨大潜力,包括微流体自适应成像和生物医学传感。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/93a9/11501908/6e8df80ff8b6/j_nanoph-2021-0629_fig_001.jpg

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