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通过二氧化硅集成提高钕掺杂钆镓石榴石 whispering-gallery-mode 微盘激光器的热稳定性

Enhancing thermal stability of Nd:GGG WGM microdisk lasers via silica integration.

作者信息

Li Huiqi, Wang Zhaocong, Wang Lei, Tan Yang, Chen Feng

机构信息

School of Physics, State Key Laboratory of Crystal Materials, Shandong University, Jinan 250100, China.

出版信息

Nanophotonics. 2024 Apr 15;13(15):2819-2827. doi: 10.1515/nanoph-2024-0011. eCollection 2024 Jul.

Abstract

Whispering gallery mode (WGM) resonators, as an integral component of integrated photonics, have attracted considerable attention due to their high factor, small footprint, and small mode volume, making them widely applied as microlasers. In this work, Nd:GGG crystal was prepared into a Nd:GGG film with thickness of 1.8 μm through ion implantation-enhanced etching (IIEE) technique, and subsequently, the Nd:GGG film was partened by focused ion beam (FIB) technology to generate a microdisk with diameter of 20 μm. For high-power microcavity lasers, heat generation during laser operation was inevitable. We placed the microdisk on a silica holder and a silica wafer, respectively. The microdisk placed on the silica holder and silica wafer exhibited laser thresholds of 32 μW and 17 μW, respectively. Moreover, due to different heat dissipation conditions, the microdisk placed on the silica holder exhibited a mode shift of 0.13 nm/mW, while the microdisk placed on the silica wafer showed a more stable laser output state with a mode shift of 0.02626 nm/mW.

摘要

回音壁模式(WGM)谐振器作为集成光子学的一个组成部分,因其高品质因数、小尺寸和小模式体积而备受关注,使其被广泛用作微激光器。在这项工作中,通过离子注入增强蚀刻(IIEE)技术将Nd:GGG晶体制备成厚度为1.8μm的Nd:GGG薄膜,随后,通过聚焦离子束(FIB)技术对Nd:GGG薄膜进行加工,以生成直径为20μm的微盘。对于高功率微腔激光器,激光运行过程中的发热是不可避免的。我们分别将微盘放置在二氧化硅支架和二氧化硅晶片上。放置在二氧化硅支架和二氧化硅晶片上的微盘的激光阈值分别为32μW和17μW。此外,由于散热条件不同,放置在二氧化硅支架上的微盘的模式漂移为0.13nm/mW,而放置在二氧化硅晶片上的微盘表现出更稳定的激光输出状态,模式漂移为0.02626nm/mW。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2da6/11501700/7897cad075e4/j_nanoph-2024-0011_fig_001.jpg

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