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揭示Ni(HITP)金属有机框架薄膜的尺度依赖性电导率的起源

Unveiling the Origin of the Scale-Dependent Conductivity of Ni(HITP) Metal-Organic Framework Thin Films.

作者信息

Osuna Eva, Ares Pablo, Gómez-Herrero Julio, Llauradó-Capdevila Gemma, Rodríguez-San-Miguel David, Pané Salvador, Puigmartí-Luis Josep, Gómez-Navarro Cristina

机构信息

Departamento de Física de la Materia Condensada, Universidad Autónoma de Madrid, Madrid, 28049, Spain.

Condensed Matter Physics Center (IFIMAC), Universidad Autónoma de Madrid, Madrid, 28049, Spain.

出版信息

Small. 2025 Feb;21(8):e2407945. doi: 10.1002/smll.202407945. Epub 2025 Jan 16.

Abstract

Conductive metal-organic frameworks (MOFs) are crystalline, intrinsically porous materials that combine remarkable electrical conductivity with exceptional structural and chemical versatility. This rare combination makes these materials highly suitable for a wide range of energy-related applications. However, the electrical conductivity in MOF-based devices is often limited by the presence of different types of structural disorder. Here, the electrical transport characteristics of high quality Ni(HITP) nanometer-thin films are reported. These findings reveal a tenfold difference in conductivity between the micro- and nano-scale, attributed to poor electrical connection among a limited number of crystalline grains. Average in-plane conductivity values at the micro- (σ = 0.7 ± 0.3 S cm) and nano- (σ = 6 ± 3 S cm) scales is determined, and the value of the inter-grain resistance, R = 40 kΩ is found. Using a 2D resistor network model with a 40 kΩ base resistance and scattered higher resistances, surface potential maps of in-operando MOF-based electrical devices are successfully reproduced. Additionally, a structure-property relationship that links the density and spatial distribution of electrical failures in inter-grain connections to the observed micro-scale conductivity in MOF thin films is established.

摘要

导电金属有机框架材料(MOFs)是一种晶体材料,本质上具有多孔性,它将出色的导电性与卓越的结构和化学多功能性结合在一起。这种罕见的组合使这些材料非常适合广泛的能源相关应用。然而,基于MOF的器件中的电导率通常受到不同类型结构无序的限制。在此,报告了高质量Ni(HITP)纳米薄膜的电输运特性。这些发现揭示了微米级和纳米级之间电导率存在十倍的差异,这归因于有限数量的晶粒之间不良的电连接。确定了微米级(σ = 0.7 ± 0.3 S cm)和纳米级(σ = 6 ± 3 S cm)的平均面内电导率值,并发现晶粒间电阻值R = 40 kΩ。使用具有40 kΩ基本电阻和分散的更高电阻的二维电阻网络模型,成功再现了基于MOF的工作中电气设备的表面电势图。此外,建立了一种结构-性能关系,该关系将晶粒间连接中电气故障的密度和空间分布与MOF薄膜中观察到的微米级电导率联系起来。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/cc96/11855259/d01d8bd5385f/SMLL-21-2407945-g003.jpg

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