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通过热退火实现纤锌矿氮化物半导体压电性的前所未有的增强。

Unprecedented enhancement of piezoelectricity of wurtzite nitride semiconductors via thermal annealing.

作者信息

Mondal Shubham, Tanim Md Mehedi Hasan, Baucom Garrett, Dabas Shaurya S, Gao Jinghan, Liu Jiangnan, Ye Zhengwei, Gaddam Venkateswarlu, Ross Aiden, Chen Long-Qing, Kim Honggyu, Tabrizian Roozbeh, Mi Zetian

机构信息

Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, MI, USA.

Department of Materials Science and Engineering, University of Florida, Gainesville, FL, USA.

出版信息

Nat Commun. 2025 May 3;16(1):4130. doi: 10.1038/s41467-025-59179-2.

Abstract

Incorporating rare-earth elements into wurtzite nitride semiconductors, such as scandium-alloyed aluminum nitride (ScAlN), significantly enhances the piezoelectric response, which is vital for a broad range of acoustic, electronic, photonic, and quantum applications. To date, however, the measured piezoelectric response of nitride semiconductors is far below what theory has predicted. Herein, we demonstrate a simple, scalable, post-growth thermal annealing process that can dramatically boost the piezoelectric response of ScAlN. We achieve a 3.5-fold increase in the piezoelectric modulus, d for ScAlN, from 12.3 pC/N in the as-grown state to 45.5 pC/N, which is eight times larger than that of AlN commercially used in 5 G cellphones. The observed enhancement is unambiguously confirmed by three separate measurement techniques. Detailed material characterization techniques reveal that optimized annealing conditions significantly improve the macroscopic structural quality, achieving a more homogeneous and ordered domain orientation, and reduces the lattice parameter ratio (c/a) in the wurtzite crystal structure. The dramatic enhancement of d in ScAlN thin films promises extreme frequency scaling opportunities for bulk acoustic wave resonators for beyond-5 G applications.

摘要

将稀土元素掺入纤锌矿氮化物半导体中,例如钪合金化的氮化铝(ScAlN),可显著增强压电响应,这对于广泛的声学、电子、光子和量子应用至关重要。然而,迄今为止,氮化物半导体的实测压电响应远低于理论预测值。在此,我们展示了一种简单、可扩展的生长后热退火工艺,该工艺可显著提高ScAlN的压电响应。我们使ScAlN的压电模量d提高了3.5倍,从生长态的12.3 pC/N提高到45.5 pC/N,这比5G手机中商业使用的AlN大八倍。三种独立的测量技术明确证实了观察到的增强效果。详细的材料表征技术表明,优化的退火条件显著改善了宏观结构质量,实现了更均匀且有序的畴取向,并降低了纤锌矿晶体结构中的晶格参数比(c/a)。ScAlN薄膜中d的显著增强为用于5G以上应用的体声波谐振器带来了极高的频率缩放机遇。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/a32c/12049508/1611d7174c84/41467_2025_59179_Fig1_HTML.jpg

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