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在环境空气中通过远场飞秒激光驱动制备二维范德华NbOI纳米结构的λ/73超分辨率制造。

Far-field femtosecond laser-driven λ/73 super-resolution fabrication of 2D van der Waals NbOI nanostructures in ambient air.

作者信息

Guan Yanchao, Ding Ye, Fang Yuqiang, Li Jingyi, Liu Yanan, Wang Rui, Hao Juanyuan, Xie Hui, Xu Chengyan, Zhen Liang, Li Yang, Yang Lijun

机构信息

School of Mechatronics Engineering, Harbin Institute of Technology, Harbin, China.

Key Laboratory of Micro-systems and Micro-structures Manufacturing, Ministry of Education, Harbin Institute of Technology, Harbin, China.

出版信息

Nat Commun. 2025 May 4;16(1):4149. doi: 10.1038/s41467-025-59520-9.

DOI:10.1038/s41467-025-59520-9
PMID:40320417
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC12050275/
Abstract

The design and fabrication of ultrafine nanostructures in two-dimensional (2D) van der Waals materials are crucial for the functionalization of electronic devices. Here, we report the utilization of far-field femtosecond laser patterning to fabricate super-resolution nano-groove array (NGA) structures in 2D multilayer NbOI in ambient air, achieving groove widths as low as 14.5 nm (λ/73). The NGA structures maintain a well-defined single-crystal NbOI with amorphous NbO edges as narrow as 3.2 nm. The formation mechanism of NGA structure is confirmed to be associated with the coupled field of surface plasmon polariton periodic field and nano-groove-induced local near-field induced by femtosecond laser irradiation. Furthermore, the NGA-NbOI gas sensor exhibits NO sensing performance, with a rapid response time (5.1 s), which is attributed to the existence of abundant NbOI-NbO heterojunctions. This approach will propel the further development of nano-lithography techniques for functional device applications of 2D materials.

摘要

在二维(2D)范德华材料中设计和制造超细纳米结构对于电子器件的功能化至关重要。在此,我们报道了利用远场飞秒激光光刻技术在环境空气中的二维多层NbOI中制造超分辨率纳米沟槽阵列(NGA)结构,实现了低至约14.5 nm(约λ/73)的沟槽宽度。NGA结构保持了具有仅3.2 nm窄的非晶NbO边缘的明确单晶NbOI。NGA结构的形成机制被证实与表面等离激元极化子周期场和飞秒激光辐照诱导的纳米沟槽诱导的局部近场的耦合场有关。此外,NGA-NbOI气体传感器表现出对NO的传感性能,响应时间快速(5.1 s),这归因于大量NbOI-NbO异质结的存在。这种方法将推动用于二维材料功能器件应用的纳米光刻技术的进一步发展。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/c8ee/12050275/657c7fdac3fa/41467_2025_59520_Fig5_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/c8ee/12050275/93a79b567354/41467_2025_59520_Fig1_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/c8ee/12050275/9d373077787f/41467_2025_59520_Fig2_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/c8ee/12050275/81c69f773895/41467_2025_59520_Fig3_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/c8ee/12050275/f3256e1c21e8/41467_2025_59520_Fig4_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/c8ee/12050275/657c7fdac3fa/41467_2025_59520_Fig5_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/c8ee/12050275/93a79b567354/41467_2025_59520_Fig1_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/c8ee/12050275/9d373077787f/41467_2025_59520_Fig2_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/c8ee/12050275/81c69f773895/41467_2025_59520_Fig3_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/c8ee/12050275/f3256e1c21e8/41467_2025_59520_Fig4_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/c8ee/12050275/657c7fdac3fa/41467_2025_59520_Fig5_HTML.jpg

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