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聚酰亚胺和聚酰胺6薄膜常压空气等离子体表面处理中的放电能量与暴露时间

Discharge Energy Versus Exposure Time in Atmospheric-Pressure Air Plasma Surface Treatment of Polyimide and Polyamide 6 Films.

作者信息

Hatescu Iustina, Borcia Cătălin, Ciobanu Roxana, Borcia Gabriela

机构信息

Iasi Plasma Advanced Research Center (IPARC), Faculty of Physics, Alexandru Ioan Cuza University, Blvd. Carol I No. 11, 700506 Iasi, Romania.

出版信息

Polymers (Basel). 2025 May 19;17(10):1394. doi: 10.3390/polym17101394.

Abstract

Polyimide (PI) and polyamide 6 (PA6) films are treated under exposure times of 0.5 s and 1.0 s, and energy levels of 1.5, 2.0, and 2.3 mJ/pulse. PI exhibits the most substantial improvement in wettability and adhesion-related properties compared to PA6 and other studied polar polymers. The threshold level for stable surface modification is reduced, achieving a minimum water contact angle of 45°. The stability is markedly enhanced, with aged PI surfaces showing a 40% relative increase in adhesion work compared to untreated samples. The oxygen content on the PI surface reaches 22 at. %, surpassing the maximum of 18 at. % O observed for PA6. The surface roughness of PI increases by approximately a factor of 2, while PA6 shows an average increase of only 25%, attributed to higher ablation rates in the amorphous phase compared to the crystalline phase. The degree of surface modification achieved with [1.0 s; 1.5 mJ] treatment parameters is comparable to that with [0.5 s; 2.0 mJ], demonstrating that higher discharge energy can effectively shorten the required exposure time. This plasma treatment, even at very short exposure times, enables significant enhancement of the surface properties of PI, typically characterized by high chemical stability.

摘要

聚酰亚胺(PI)和聚酰胺6(PA6)薄膜在曝光时间为0.5秒和1.0秒以及能量水平为1.5、2.0和2.3毫焦/脉冲的条件下进行处理。与PA6和其他研究的极性聚合物相比,PI在润湿性和粘附相关性能方面表现出最显著的改善。稳定表面改性的阈值水平降低,实现了45°的最小水接触角。稳定性显著增强,老化的PI表面与未处理样品相比,粘附功相对增加了40%。PI表面的氧含量达到22原子%,超过了PA6观察到的最大氧含量18原子%。PI的表面粗糙度增加了约2倍,而PA6仅平均增加25%,这归因于非晶相比结晶相具有更高的烧蚀速率。用[1.0秒;1.5毫焦]处理参数实现的表面改性程度与[0.5秒;2.0毫焦]相当,表明更高的放电能量可以有效地缩短所需的曝光时间。这种等离子体处理即使在非常短的曝光时间下,也能显著提高PI的表面性能,PI通常具有高化学稳定性。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ad1e/12114765/d9927c1b9eee/polymers-17-01394-g001.jpg

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