Seo Dabin, Kim Dahyeon, Ryu Jiyeon, Pyo Changwoo, Lee Seungchan, Yoon Tae-Sik, Kim Myungsoo
Graduate School of Semiconductor Materials and Devices Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan, 44919, South Korea.
Department of Electrical Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan, 44919, South Korea.
Adv Sci (Weinh). 2025 Aug;12(31):e01989. doi: 10.1002/advs.202501989. Epub 2025 May 28.
Vanadium oxide (VO) based memristor is a promising candidate for next-generation non-volatile memory and radio-frequency (RF) switches due to its compatibility with wafer-level integration and high-frequency operation. This work demonstrates high-performance VO memristor with gold and silver electrodes, achieving a higher cutoff frequency compared to previously reported VO devices. The devices exhibit long retention, high endurance (≈10 cycles), and nanosecond switching speeds, enabling the fabrication of RF switches with a cutoff frequency of ≈4.5 THz, low insertion loss (< 0.46 dB), and high isolation (>20 dB) from 0.1 to 20 GHz with stable operation extended to frequency up to 67 GHz. Leveraging these switches, a reconfigurable X-band bandpass filter whose is realized center frequency is tuned from 8.2 GHz in the OFF state to 7.6 GHz in the ON state, achieving a tunable range of ≈600 MHz. This demonstration paves the way for compact and versatile RF front-ends with improved frequency agility in advanced communication systems.
基于氧化钒(VO)的忆阻器因其与晶圆级集成的兼容性和高频操作特性,成为下一代非易失性存储器和射频(RF)开关的有力候选者。这项工作展示了带有金和银电极的高性能VO忆阻器,与先前报道的VO器件相比,实现了更高的截止频率。这些器件具有长保持性、高耐久性(约10次循环)和纳秒级开关速度,能够制造出截止频率约为4.5太赫兹、低插入损耗(<0.46分贝)且在0.1至20吉赫兹范围内具有高隔离度(>20分贝)的RF开关,稳定操作频率可扩展至67吉赫兹。利用这些开关,实现了一种可重构X波段带通滤波器,其中心频率在关断状态下从8.2吉赫兹调谐到导通状态下的7.6吉赫兹,调谐范围约为600兆赫兹。这一演示为先进通信系统中具有更高频率灵活性的紧凑通用RF前端铺平了道路。