Mosa Md Abu, Jo Jeong Yeop, Park Sang-Hyeon, Kwon Kye-Si
Department of Electronic Materials, Devices and Equipment Engineering, Soonchunhyang University, 22, Soonchunhyang-ro, Asan, Chungnam, 31538, South Korea.
Department of Mechanical Engineering, Soonchunhyang University, 22, Soonchunhyang-ro, Asan, Chungnam, 31538, South Korea.
Small. 2025 Aug;21(31):e2504037. doi: 10.1002/smll.202504037. Epub 2025 Jun 5.
The advancement of electronic devices necessitates the fabrication of high-precision, 3D conductive microstructures using functional materials. This study introduces an improved pneumatic shuttering method for aerosol printing (AP), enabling the fabrication of 3D microstructures. The approach overcomes the limitations of conventional AP techniques, which struggle to print dot-based structures essential for constructing intricate 3D geometries layer by layer. To address this challenge, a pneumatic shuttering mechanism based on flow-path control is developed, enabling rapid on-off jet for both line and dot printing. This technique allows precise dot modulation (ranging from 20 to 144 µm), facilitating high-resolution and scalable patterning. Leveraging this capability, an analog halftoning technique is implemented, enabling precise control of the deposition of functional materials. Additionally, the method supports the fabrication of complex 3D microstructures, including conductive pillars with customizable angles relative to the substrate. These pillars serve as interconnects for chips with uneven surfaces, effectively addressing challenges associated with large height variations. This advancement in AP technology significantly enhances deposition precision and patterning flexibility, broadening its potential for advanced material applications in next-generation electronics and additive manufacturing.
电子设备的发展需要使用功能材料制造高精度的三维导电微结构。本研究介绍了一种改进的用于气溶胶打印(AP)的气动快门方法,能够制造三维微结构。该方法克服了传统AP技术的局限性,传统技术难以打印基于点的结构,而这些结构对于逐层构建复杂的三维几何形状至关重要。为应对这一挑战,开发了一种基于流路控制的气动快门机制,实现了用于线条和点打印的快速开关喷射。该技术允许精确的点调制(范围从20到144微米),有助于实现高分辨率和可扩展的图案化。利用这一能力,实施了一种模拟半色调技术,能够精确控制功能材料的沉积。此外,该方法支持制造复杂的三维微结构,包括相对于基板具有可定制角度的导电柱。这些柱用作具有不平表面的芯片的互连,有效解决了与大高度变化相关的挑战。AP技术的这一进展显著提高了沉积精度和图案化灵活性,拓宽了其在下一代电子和增材制造中先进材料应用的潜力。