Kazim Shafaq, Parmar Rahul, Azizinia Maryam, Amati Matteo, Rauf Muhammad, Di Cicco Andrea, Rezvani Seyed Javid, Mastrippolito Dario, Ottaviano Luca, Klimczuk Tomasz, Gregoratti Luca, Gunnella Roberto
Physics Division, School of Science and Technology, University of Camerino, 62032 Camerino (MC), Italy.
Elettra-Sincrotrone Trieste, Strada Statale 14, AREA Science Park, 34149 Trieste, Italy.
Beilstein J Nanotechnol. 2025 Jun 2;16:749-761. doi: 10.3762/bjnano.16.58. eCollection 2025.
The modifications in the electronic properties induced by the thickness and size of an individual flake of transition-metal halides on different substrates (silicon oxide or In-doped tin oxide) are of particular technological interest, even more in the case of chromium trihalides (CrX, X = Cl, Br, and I), whose longer lifetime under ambient conditions is particularly intriguing. By using synchrotron-based scanning photoelectron microscopy with a resolution of 0.1 μm and Kelvin probe force microscopy, we evaluated the surface modification reaction and the surface potential. Our results established the correlations of the two latter properties with the thickness of flakes, observing a natural tendency to preserve their characteristic when the flakes have significantly less thickness. This is in contrast to thicker flakes, which show alteration patterns similar to those observed in bulk-cleaved samples (Kazim, S.; Mastrippolito, D.; Moras, P.; Jugovac, M.; Klimczuk, T.; Ali, M.; Ottaviano, L.; Gunnella, R. , , 3806-3814. https://doi.org/10.1039%2FD2CP04586A%29. This preliminary study investigates interfaces made by dry transfer of CrCl flakes in an atmospheric environment. Cl vacancies and the formation of O/CrCl are induced, serving as dissociation centers that facilitate the migration of Cl vacancies between the top and bottom surfaces. By manipulating 2D atomic layers via surface oxidation or the introduction of surface vacancies, a novel and versatile approach is unveiled for the development of low-dimensional multifunctional nanodevices.
由不同衬底(氧化硅或铟掺杂氧化锡)上单个过渡金属卤化物薄片的厚度和尺寸所引起的电子性质变化具有特殊的技术意义,对于三卤化铬(CrX,X = Cl、Br和I)而言更是如此,其在环境条件下更长的寿命尤其引人关注。通过使用分辨率为0.1μm的基于同步加速器的扫描光电子显微镜和开尔文探针力显微镜,我们评估了表面改性反应和表面电势。我们的结果确定了后两种性质与薄片厚度之间的相关性,观察到当薄片厚度显著更小时,它们具有保持其特性的自然趋势。这与较厚的薄片形成对比,较厚薄片显示出与在块状劈开样品中观察到的类似的变化模式(Kazim, S.; Mastrippolito, D.; Moras, P.; Jugovac, M.; Klimczuk, T.; Ali, M.; Ottaviano, L.; Gunnella, R. , , 3806 - 3814. https://doi.org/10.1039%2FD2CP04586A%29)。这项初步研究调查了在大气环境中通过干转移CrCl薄片形成的界面。诱导了Cl空位以及O/CrCl的形成,它们作为解离中心促进了Cl空位在上下表面之间的迁移。通过表面氧化或引入表面空位来操纵二维原子层,揭示了一种用于开发低维多功能纳米器件的新颖且通用的方法。