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拓扑绝缘体上莫尔表面态的制备与表征

Fabrication and Characterization of the Moiré Surface State on a Topological Insulator.

作者信息

Zhang Yi, Liu Dang, Yu Qiaoyan, Xi Ruijun, Chen Xingsen, Xue Shasha, Sun Jice, Du Xian, Ning Xuhui, Miao Tingwen, Hu Pengyu, Yang Hao, Guan Dandan, Liu Xiaoxue, Liu Liang, Li Yaoyi, Wang Shiyong, Liu Canhua, Ji Haijiao, Yuan Noah F Q, Zheng Hao, Jia Jinfeng

机构信息

Tsung-Dao Lee Institute, Key Laboratory of Artificial Structures and Quantum Control (Ministry of Education), School of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai 200240, China.

Hefei National Laboratory, Hefei 230088, China.

出版信息

Nano Lett. 2025 Sep 3;25(35):13341-13346. doi: 10.1021/acs.nanolett.5c03535. Epub 2025 Aug 7.

Abstract

A Moiré superlattice on the topological insulator surface is predicted to exhibit many novel properties but has not been experimentally realized. Here, we developed a two-step growth method to successfully fabricate a topological insulator SbTe thin film with a Moiré superlattice, which is generated by a twist of the topmost layer via molecular beam epitaxy. The established Moiré topological surface state is characterized by scanning tunneling microscopy and spectroscopy. By application of a magnetic field, new features in Landau levels arise on the Moiré region compared to the pristine surface of SbTe, which makes the system a promising platform for pursuing next-generation electronics. Notably, the growth method, which circumvents contamination and the induced interface defects in the manual fabrication method, can be widely applied to other van der Waals materials for fabricating Moiré superlattices.

摘要

理论预测拓扑绝缘体表面的莫尔超晶格会展现出许多新奇特性,但尚未通过实验实现。在此,我们开发了一种两步生长法,成功制备出具有莫尔超晶格的拓扑绝缘体SbTe薄膜,该超晶格是通过分子束外延使最顶层发生扭曲而产生的。利用扫描隧道显微镜和光谱对所形成的莫尔拓扑表面态进行了表征。施加磁场后,与SbTe的原始表面相比,莫尔区域的朗道能级出现了新特征,这使得该系统成为开发下一代电子产品的理想平台。值得注意的是,该生长方法避免了手工制备方法中的污染和诱导界面缺陷,可广泛应用于其他范德华材料以制备莫尔超晶格。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8bb3/12412165/9a3d7067bf92/nl5c03535_0001.jpg

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