Voronov Dmitriy, Park Sooyeon, Huang Lei, Islegen-Wojdyla Antoine, Gullikson Eric, Padmore Howard, Wang Tianyi, Idir Mourad
Advanced Light Source, Lawrence Berkeley National Laboratory, 1 Cyclotron Rd, MS 2R400, Berkeley, CA 94720, USA.
NSLS II, Brookhaven National Laboratory, BNL Building 703, Upton, NY 11973, USA.
J Synchrotron Radiat. 2025 Sep 1;32(Pt 5):1194-1200. doi: 10.1107/S1600577525005946. Epub 2025 Aug 18.
We have developed a new process for the production of ultra-precise variable line spacing (VLS) lamellar diffraction gratings through nanofabrication. The process enables the fabrication of full-size X-ray gratings with sub-nanometre accuracy in groove depth, an optimal land-to-groove ratio, and uniform groove depth across the entire grating area. We also established a method for evaluating VLS groove density variation using stitched Fizeau interferometry. The measurements confirmed the exceptionally high accuracy of the VLS groove density in the fabricated gratings, which is well within the specification tolerances while the residual groove density errors are vanishingly small. The gold-coated grating demonstrated near-theoretical diffraction efficiency across the energy range of 100-1200 eV.
我们通过纳米制造开发了一种用于生产超精密可变线间距(VLS)层状衍射光栅的新工艺。该工艺能够制造出全尺寸的X射线光栅,其槽深精度达到亚纳米级,具有最佳的脊宽与槽宽比,并且在整个光栅区域内槽深均匀。我们还建立了一种使用拼接菲索干涉测量法评估VLS槽密度变化的方法。测量结果证实了所制造光栅中VLS槽密度具有极高的精度,完全在规格公差范围内,而残余槽密度误差极小。镀金光栅在100 - 1200 eV的能量范围内表现出接近理论值的衍射效率。